EV Group’s new NIL stepper features a dual-stage alignment system for use in reduced-pressure environments, which enhances pattern fidelity, compared to approaches involving ambient pressure. The stepper targets sub-50-nm overlay alignment accuracy and a lithography resolution down to 10 nm.

(December 16, 2004) Midland, Mich. &#8212 Dow Corning announces that it will begin supplying its Z3MS CVD Precursor (trimethylsilane) through non-exclusive distribution arrangements with a number of distributors that supply gas to semiconductor manufacturers. The new distribution model will become effective as of January 2005.