BOSTON, MA — In recent years, the issue of controlling airborne molecular contaminants (AMC) has become more important as wafer geometries expand and line width intervals tighten. The number of ways to apply chemical filtration for the control of AMC have grown, just as the methods employed to measure AMC and evaluate filter system performance have increased.

The cleanroom industry will have an opportunity to explore one such method – the growing use of reactivity monitoring as an air monitoring technique – in depth at CleanRooms East 2001, which will be held March 12-14 at Boston’s World Trade Center.

Attendees will learn a variety of AMC control strategies for semiconductor fabs; chemical filtration application areas; and various types of chemical filters and filtration systems.

The conference session, which is a new offering this year, will be hosted by Chris Muller, technical services manager of Atlanta-based Purafil, Inc. The session will take place from 1 p.m. to 3 p.m. on Tuesday, March 13.

“We’re going to present the info to help bridge the gap in the cause and effect of AMC to different process issues,” Muller said.

Whether employed in real-time or passive form, reactivity monitoring has been used in many fabs as a way to determine the levels of AMC and to evaluate the effectiveness of AMC control strategies.

“We’re just promoting this as a first line of defense,” Muller said.

For more information about CleanRooms East 2001, please call (603) 891-9267.