New Process Attracts Attention

Donna R. Fitzpatrick

President and CEO

Radiance Services Co.

Bethesda, MD

To the Editor:

The article, “New Wafer Cleaning Method Eliminates Water/Chemical Requirements,” CleanRooms, Jan. 1996, p.1, provided a great deal of useful information about the Radiance process to your readers. Many of these readers called Radiance to obtain additional information and discuss the application of the process to their needs.

The Radiance process is attracting the attention of process engineers for cleaning semiconductor wafers, photomasks, heart valves, printed circuit boards, capacitors and resonators, fiberoptics, coated and uncoated lenses, metal foils, aircraft and auto parts, and beer cans.

We would like to thank CleanRooms for such a well-written and thorough article and for sharing this very promising technology with its readers.