SAN FRANCISCO, CA (July 11, 2005)- BOC Edwards, a global leader in the supply of electronic materials for microelectronics manufacturing, has reported significant progress in qualifying its PureFilm(tm) trimethylsilane in volume production. The company’s electronic materials group reports that it has qualified its 99.999% trimethylsilane on both 200 mm and 300 mm platforms as the primary low k dielectric at semiconductor fabs in the U.S. Additional product qualifications are in progress.

BOC Edwards supplies trimethylsilane with a unique 99.999% purity specification, and a complete analysis for common gas and metals impurities is available on all cylinders. The product is available through the electronic materials global distribution network.

Trimethylsilane ((CH3)3SiH) is used in CVD (chemical vapor deposition) processes for the development of low k dielectric thin film.

Editor Background

BOC Edwards, part of The BOC Group plc, is a leading supplier of integrated solutions for the manufacture of microelectronics devices, including semiconductors and flat panel displays. Partnering with fabs, foundries and process tool manufacturers. BOC Edwards provides electronic materials and process-enabling subsystems that are supported by best-in-class operations and maintenance services for its global customer base.

The BOC Group is one of the largest and most global of the world’s leading gases companies. Serving two million customers in more than 50 countries, BOC employs over 30,000 people and had annual sales of nearly £4.6 billion (more than US $8 billion) in 2004.

Information on the BOC Group can be accessed by visiting the Group web site, www.boc.com. Specific information on BOC Edwards can be found at www.bocedwards.com. E-mail inquiries can be sent to [email protected].

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