JAN. 28–LEUVEN, Belgium–IMEC’s board of directors says the company will move ahead with the construction of a new 300 mm cleanroom.

Construction of the new 23,680-square-foot research fab will begin in February 2003, with completion expected in approximately 18 months. The facility is also expected to go on-line in mid 2005, with activities gradually ramping up. The initiative involves an investment of $77 million, of which $34 million has been granted by local government.

The new fab will be located adjacent to IMEC’s existing facilities to ensure and optimize the exchange of information and to share common facilities, infrastructure and metrology tools.

IMEC will set up several research programs targeting the most important issues identified by the International Technology Roadmap for Semiconductors for the sub-45 nanometer (nm) node. The focus will be on EUV lithography, new materials, advanced devices and innovative interconnect schemes. The programs will be open for semiconductor companies and material and
equipment suppliers worldwide.

“We’ve received very strong signals from the industry worldwide that they wish to continue collaboration with IMEC in pioneering research for the 300-mm era,” says Gilbert Declerck, IMEC’s president. “This 300-mm research facility will allow us to fulfill the requests by the industry to perform research on the most advanced process steps, materials and devices for the sub-45nm node and around, above and beside CMOS.”