FSI International garners $1.9 million sale

FSI International garners $1.9 million sale

Minneapolis

After successfully completing evaluations in the customer`s fab, FSI International Inc.`s Surface Conditioning Division received an order for $1.9 million for its Aries CryoKinetic and Excalibur Vapor wafer cleaning systems. The customer will be utilizing the systems in a single-etch process for advanced capacitor formation on its semiconductor devices.

The Aries system uses inert, frozen gas crystals to clean wafers for defect reduction and yield enhancement, a technology originally developed by IBM and licensed by FSI in 1995. FSI has since developed the technology into a production system for cryokinetic, dry-wafer cleaning that can be used at any point in the manufacturing process.

The Excalibur system performs critical cleaning and specialty etching applications, etching sacrificial oxides away, while leaving structural oxides virtually untouched at a ratio of more than 1,000 to 1. — SES

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