Oct. 23, 2006 — Benchmark Technologies of Lynnfield, Mass., and Holographix LLC of Hudson, Mass., announced they have entered into an exclusive manufacture and resale agreement for the fabrication and distribution of custom nano-imprint templates.
Under the agreement, Holographix will provide replicated nano-imprint lithography templates (molds and stamps) produced from master templates using its proprietary room-temperature UV-cure polymer replication process. Benchmark will provide sales, marketing and application support and will assist customers with design and procurement of the master templates used in the process.
“Holographix’ proprietary polymer replication process has been proven robust and capable of producing stable nano-scale features. We have been providing such replication services to a wide array of industries including life sciences, telecom, and metrology for several years,” said David Rowe, president and CEO of Holographix, in a prepared statement. “We look forward to working with Benchmark Technologies to service the needs of those customers in the nano-imprint arena.”
Patrick Reynolds, Benchmark Technologies president and founder said the Holographix replication process fills a void in the imprint template infrastructure by allowing for the fabrication of transparent UV nano-imprint lithography (UV-NIL) templates from relief structures fabricated on any substrate, including those that are opaque to UV radiation. He said the company believes the new partnership will open new template possibilities for nano-scale research that had not been previously available.
Holographix is a leading provider of replication services for optics, micro-optics, diffraction gratings, micro-fluidic structures and nano-imprint templates. Benchmark provides lithographic test reticle design and fabrication services to the semiconductor, MEMS, disc drive, photonics and other industries. The company also provides consultative fabrication procurement services to companies that require precision complex pattern and relief structures by leveraging the semiconductor industry lithography infrastructure.