August 28, 2007 — Rigaku Americas Corp.‘s new Ultima IV X-ray Diffractometer is an advanced, general-purpose X-ray diffraction (XRD) instrument for materials science, semiconductor, and nanotechnology R&D as well as quality assurance for the manufacturing environment. The design features a new high speed detector for 100X faster measurements, unrivaled application flexibility provided by patented Cross Beam Optics (CBO), and a 50% smaller size than a conventional XRD system.

A fully optioned Rigaku Ultima IV can span applications that would have required up to four separate conventional XRD instruments in the past. A modular “build-up” platform allows users to add capabilities as requirements arise, including support for high-resolution diffraction, thin-film measurement, micro diffraction, and handling very small samples.

Ultima IV’s patented Cross Beam Optics (CBO) mechanism allows user selectable switching between either a focusing or parallel incident X-ray beam without resetting or realigning the optical system. Both system geometries are permanently mounted and permanently aligned to allow easy changeover for different applications. According to Rigaku, all other X-ray diffraction systems require system reconfiguration when switching operation between focusing and parallel beam geometries. In addition, the Ultima IV’s new optics for micro diffraction promises data quality close to that provided by a dedicated microdiffraction system.

The Ultima IV measures 1100 mm W x 810 mm D x 1630 mm H&#8212and, according to Rigaku, requires 50% less space and has 20% less mass than conventional XRD instruments. Its sample stage height is 300 mm lower than a conventional XRD system for ease-of-use.