Jan. 11, 2007 — Molecular Imprints Inc. (MII), an Austin, Texas, maker of nano-imprint lithography systems, announced the shipment of an Imprio 250 for Next Generation Lithography (NGL) to a leading semiconductor memory manufacturer.

The company says its Step and Flash Imprint Lithography (S-FIL) technology can replicate the ultra high resolution of e-beam lithography with the low cost of ownership of optical lithography to provide a manufacturing solution that can be extended through multiple technology generations. The expected initial use of the system will be process development and device prototyping at 32nm and below.

“MII has made tremendous progress over the last 12 months to provide an NGL solution to the semiconductor industry. This tool sale is a clear validation of our progress” said Mark Melliar-Smith, CEO of Molecular Imprints, in a prepared statement. “We believe MII’s S-FIL technology is an ideal complement to 193i optical lithography for critical layer applications at the 32nm generation and a complete solution at 22nm.”

In addition to semiconductor applications, Molecular Imprints says its high resolution and low cost S-FIL technology is gaining broader market acceptance by enabling advances in high performance hard disk drives (HDD) and light emitting diodes (LED), which further validates the capability and value of its Imprio products.