June 5, 2006 – EBARA Corporation, a Japanese-based equipment and component supplier for semiconductor manufacturing, will conduct nanoelectronics research and development at the Albany NanoTech complex as part of a $5 million program being launched in partnership with the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
Located at CNSE’s Center for Semiconductor Research, the three-year program is designed to develop advanced chemical mechanical planarization processes and electrolytic plating methodologies for 300mm copper wiring applications. The goal of the joint initiative is to support process and hardware advances that will enhance reliability in leading-edge nanoelectronics device manufacturing at the 32nm node and beyond.
As part of the agreement, EBARA will initially locate five employees at CNSE’s Albany NanoTech complex. In addition to utilizing the UAlbany NanoCollege’s facilities, EBARA has installed two new tools, one designed for CMP and the other for electrochemical deposition.