October 22, 2008: Structured Materials Industries Inc. (SMI) has sold a NanoH CVD system. SMI’s line of NanoH CVD systems are dedicated to providing researchers with high-end source handling capabilities coupled with small-scale reactors for low net cost of purchase and low cost of operation.

This tool is focused on Si, SiO₂, and Si_xN_y deposition and film annealing; however, other systems have been implemented for group IV nanowires, silicides, antimonides, chalcogenides, etc. It features preconfigured modularity, allowing easy addition of bubbler or gas sources (in the field and by the customer), use of enhancement modules such as plasma or UV assist, and a multiple of easily exchanged heating systems (rf, lamp or resistive) for high or low temperature operation in reducing or oxidizing environments. The simple tool geometry allows researchers to easily switch between material systems by changing low-cost reactor “shell” and substrate holders.