Vistec e-beam litho to enable new tech, apps at Karlsruhe Nano Micro

September 10, 2007 — The Forschungszentrum Karlsruhe has begun using its new Electron Beam Lithography system Vistec VB6 to research new application fields for nanotechnology and microsystems technologies. “The high precision writing capability of the electron beam lithography system will allow the Forschungszentrum Karlsruhe to develop a range of new technologies and applications,” explained Mike Butler, Vistec Product Manager for Gaussian Beam Systems.

“The new Vistec system will be an important module in the overall Karlsruhe Nano Micro Facility,” said Dr. Herbert Hein, Forschungszentrum Karlsruhe. With its high performance 100kV column the VB6 system enables nanolithography of <10nm.

The Karlsruhe Nano Micro Facility, in Germany, is open to science and industry partners.

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