 The JSM-7001F characterizes nanostructures with a resolution of 1.2nm at 30kV. (Photo: JEOL) |
Mar 13, 2007 — A new thermal field emission analytical SEM from JEOL, the JSM-7001F, promises high resolution micrographs at up to 1,000,000X for applications ranging from semiconductor, metals, minerals, materials, and ceramics, to non-conductive biological samples.
The JSM-7001F features an in-lens field emission gun that delivers more than 200 nA of beam current to the sample. An extremely small probe diameter at low kV and high current is optimal for characterization of nanostructures with a resolution of 1.2nm at 30kV. The JSM-7001F targets low accelerating voltage X-ray spectroscopy and crystallography at and below the 100nm scale.
The large specimen chamber—designed for samples up to 200mm in diameter—accommodates a wide variety of detectors simultaneously. These include multiple EDS, WDS, EBSD, STEM, BSE, CL, EBIC, and IR camera. The SEM can also be equipped as a dual column FIB or an e-beam lithography tool.
The SEM comes with a choice of three stage sizes and exchange chambers, and a new 5-axis automated stage. It can be configured for both high vacuum and low vacuum operation.
The system’s Windows XP interface was designed for ease of operation and image analysis. Users can choose to display up to four live images on the screen, as well as live signal mixing.