Canon intros lithography stepper for high-volume MEMS and LED production

June 27, 2012 — Canon Inc. launched the FPA-3030i5+ i-line stepper for manufacturing micro electro mechanical systems (MEMS) and energy-efficient “green” devices such as power semiconductors in solar and wind applications and light-emitting diodes (LEDs).

Several upgrades were incorporated to the FPA-3000 series to meet the “unique process requirements” in these markets. The FPA-30303i5+ provides imaging resolution below 350nm while maintaining overlay accuracy of <40nm and throughput in excess of 104 wafers per hour (WPH).

The FPA-3030i5+ features an updated software structure and electrical control system that allow the application of advanced hardware and software options to support next-generation semiconductor manufacturing.

The FPA-3030 platform allows processing of silicon (Si), sapphire (Al2O3), silicon carbide (SiC) and a wide variety of wafer materials used in “green” device manufacturing. FPA-3030i5+ options include warped-wafer handling systems to allow processing of distorted substrates. The FPA-3030i5+ stepper can also be configured to process multiple wafer sizes, and hosts various options to improve productivity and efficiency.

Canon Inc. (NYSE:CAJ) provides digital imaging solutions. Internet: http://www.canon.com/.

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