JEOL releases high-res 200kV aberration-corrected STEM

March 10, 2009: JEOL Ltd. has introduced a new atomic resolution analytical microscope, the JEM-ARM200F.

The microscope sets a new benchmark for advanced, aberration-corrected S/TEM technology with the highest resolution commercially available in its class, according to a news release from JEOL USA, the company’s US subsidiary. Through a rigorous development and design program inspired by JEOL customers, the release said, the JEOL team has produced an entirely new platform of TEM that achieves a guaranteed HAADF-STEM (high angle annular dark field) resolution of 80 picometers, or 0.08nm.

The company said the latest in software automation has been designed into the new ARM200F, with tomography and holography simplified by a user-friendly GUI.

The University of Texas at San Antonio (UTSA) will be the site of the first installation of the new JEM-ARM200F. The microscope will be housed in the Advanced Microscopy Laboratory under the supervision of world-renowned researcher Miguel Yacaman, chair of the College of Sciences’ Department of Physics and Astronomy. There, it will support research in nanotechnology, materials science, medicine, biology, chemistry and engineering.

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