Laser lithography tool uses piezo stage to construct submicron features

April 17, 2012 — The new laser lithography tool from Nanoscribe GmbH produces complex 3D submicron structures up to 1mm with 150nm widths, boasting full automation and precise repeatability. It is based on a 3-axis piezo nano-positioning stage from PI (Physik Instrumente).

The PImars P-563 flexure-guided, piezo-driven nanopositioning XYZ stage provides positioning ranges to 300 x 300 x 300µm and nanometer-range repeatability. A parallel-metrology position feedback system based on highly linear capacitive sensors allows the sample to be moved precisely and repeatedly in relation to the laser focus. A digital piezo motion controller provides path control.

The tool can be used to construct biometric characteristics or to create microstructures for small pumps and needles.

More information on XYZ piezo nano-positioning systems is available at http://www.nanopositioning.net/XYZ_nanopositioning_stage.php#P563

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