EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced its SmartNIL large-area nanoimprint lithography (NIL) process. Available on all EV Group NIL platforms, including mask aligners as well as the industry benchmark EVG 720 and newly available EVG 7200 UV-NIL systems, SmartNIL provides a low-cost, large-area and high-volume-manufacturing solution for a variety of advanced devices, including:

• Photonic-based devices such as light-emitting diodes (LEDs), lasers and photovoltaics
• Micro arrays and nano-devices for medical devices and bioengineered applications
• Advanced storage media, including newly emerging forms of non-volatile memory (NVM)

“SmartNIL is built on more than 15 years of NIL experience at EVG that includes the largest installed base of NIL systems worldwide, and is the only NIL technology currently used in high-volume manufacturing on substrates up to 200 mm today,” stated Paul Lindner, executive technology director at EV Group. “With our new EVG7200 UV-NIL system, which has industry-leading resolution down to 20 nm in volume production, EVG brings the advanced soft stamp and imprint capability of SmartNIL to larger substrates and smaller geometries. This enables our customers to achieve even greater cost-of-ownership (CoO) benefits and realize the full manufacturing potential of nanoimprint lithography.”