Date: Tuesday, June 5, 2018 at 1:00 p.m. ET

Free to attend

Length: Approximately one hour

EUV lithography has steadily been gaining momentum in recent years and edges closer and closer to insertion in manufacturing.  While considerable progress has been made and the first uses of EUV appear imminent, there remain some difficulties that will challenge the rate and degree to which EUV can be employed.  This talk will aim to explore the patterning-related challenges that remain, summarize some of the ongoing efforts to tackle these challenges, and give an outlook towards the future.

What You’ll Learn:

• Understand how EUV lithography has steadily been gaining momentum in recent years and edges closer and closer to insertion in manufacturing.
• Hear about the difficulties that remain and how they will challenge the rate and degree to which EUV can be employed.
• Find out what’s being done to tackle these challenges, and what the outlook is towards the future.

Speaker: Greg McIntyre, Director of Advanced Patterning, imec

Greg McIntyre is Director of Advanced Patterning at imec and responsible for areas related to advanced lithography equipment and process development, metrology and patterning process control, computational lithography, and exploratory patterning materials. Prior to joining imec, he was the technical lead for various areas of advanced lithography, imaging and modeling within the IBM research alliance in Albany, New York. He has published over 80 papers, won 7 best paper awards, and has launched a successful startup in the field. Prior to becoming a lithographer, Greg served as a Captain in the US Army. He holds a Ph.D. and M.S. in electrical engineering from the University of California, Berkeley, and a B.S. from the United States Military Academy at West Point.

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