Category Archives: Lithography

By Anand Chamarthy

Materials innovation has always been vital to the semiconductor industry. In the past, it was high-κ gate dielectrics. Today, Cobalt is seen as a replacement for Tungsten in middle-of-line (MOL) contacts.

What materials innovation will the future bring?

A likely answer is Graphene, the wonder material discovered in 2004.

Graphene is one atomic layer of carbon, the thinnest and strongest material that has ever existed. It is 200 times stronger than steel and the lightest material known to man (1 square meter weighing around 0.77 mg). It is an excellent electrical and thermal conductor at room temperature with an electron mobility of ~ 200,000

cm2.V-1.s-1. At one atomic layer, graphene is flexible and transparent. Other notable properties of Graphene are its uniform absorption of light across the visible and near infrared spectrum and its applicability towards spintronics-based devices.

Graphene and Moore’s Law

Moore’s Law scaling can be broken down into 4 key areas:

  • Lithography
  • FET
  • Advanced Packaging (2.5D and 3D IC)
  • Interconnect Material

Solutions for upcoming nodes are starting to emerge in the first two areas (EUV and Nanowire- or Nanosheet-based FET respectively). Graphene play an important role in the latter two areas. For advanced packaging, Graphene can be used as a heat spreader (to lower overall thermal resistance), or as an EM shield (to lower crosstalk) as part of a 3D IC package.

Active Graphene device layers can potentially be stacked on top of each other using a low-temperature transfer process (< 400°C) to allow for a dense heterogeneous “memory near compute” configuration. This is an area DARPA is actively researching as part of its new $1.5 billion Electronics Resurgence Initiative.

Regarding interconnects, Copper interconnects are running out of steam and becoming a major IC bottleneck (projected 40% total delay for 7 nm node). Graphene’s high electron mobility and thermal conductivity make it an attractive interconnect material for MOL and back-end-of-line (BEOL), especially at line widths < 30 nm.

Graphene Device Applications

Graphene-based semiconductor applications are already starting to hit the market. A fully integrated optical transceiver (with a Graphene modulator and photodetector) operating at 25 Gb/s/channel was on display at the recent Mobile World Congress in Barcelona. San Diego-based Nanomedical Diagnostics is selling a medical device that uses a Graphene biosensor. Europe-based Emberion is building Graphene optoelectronic sensors that might find a home in LIDAR applications, where there is currently a focus on improving sensing in low-light conditions.

What will the overall Graphene roadmap in the semiconductor industry look like? The history of ion implantation serves as a good example of how a fundamental scientific discovery moves from the lab to the foundry floor.

The dominant view in the semiconductor industry at the time was that ion implantation would not work in practice (vs. thermal diffusion) and that, if it did, it would only marginally improve the manufacturing yields of existing products. There was nothing obvious about the transfer of ion bombardment techniques from nuclear physics research to semiconductor production.

Varian (led by British physicist Peter Rose) built a new, advanced ion implant tool that Mostek (DRAM manufacturer based in Texas) was able to use to create MOS ICs with clear competitive advantages. The successful collaboration between Varian and Mostek was the turning point in the development of ion implantation as a major semiconductor manufacturing process. Over the next few years, semiconductor firms used ion implantation in a growing number of process steps and, by the late 1970s, it became one of the main processes used in semiconductor manufacturing.

Likewise, the Graphene world needs to work closely with the semiconductor industry to develop the tools and techniques required to solve fundamental issues around Graphene growth (good uniformity over large area, low defect density) and Graphene transfer (high throughput, CMOS compatible). It is only then will we fully realize a future that includes 2D materials.

The first step in this process is cross-industry education and initiating the dialogue between semiconductor industry and graphene companies. The National Graphene Association will be hosting the largest gathering of graphene companies and commercial stakeholders at the Global Graphene Expo & Conference, October 15-17, 2018, in Austin, Texas.

Learn more about graphene at the upcoming Global Graphene Expo & Conference with dedicated panels of experts and investors, and roundtable discussions on how Graphene will impact the semiconductor industry. The event promo code is SEMINGA.

About the Author

Anand Chamarthy is the CEO and Co-Founder of Lab 91, an Austin-based startup that is working towards Graphene/CMOS integration at the foundry level. Anand can be reached at [email protected].

About the National Graphene Association

The National Graphene Association is the main organization and body in the U.S. promoting and advocating for commercialization of graphene and addressing critical issues such as standards and policy development.

Originally published on the SEMI blog.

In its Mid-Year Update to the 2018 McClean Report, IC Insights updated its forecast of sales growth for each of the 33 major IC product categories defined by WSTS (Figure 1).  IC Insights now projects that seven product categories will exceed the 16% growth rate expected from the total IC market this year. For the second consecutive year, the DRAM market is forecast to top all IC product segments with 39% growth. Overall, 13 product categories are forecast to experience double-digit growth and 28 total IC product categories are expected to post positive growth this year, down slightly from 29 segments in 2017.

Rising average selling prices for DRAM continued to boost the DRAM market through the first half of the year and into August.  However, IC Insights believes the DRAM ASP (and subsequent market growth) is at or near its peak, as a big rise in DRAM capital expenditures for planned capacity upgrades and expansions is likely put the brakes on steep market growth beginning in 2019.

In second place with 29% growth is the Automotive—Special-Purpose Logic market, which is being lifted by the growing number of onboard electronic systems now found on new cars. Backup cameras, blind-spot (lane-departure) detectors, and other “intelligent” systems are mandated or are being added across all new vehicles—entry level to luxury—and are expected to contribute to the semiconductor content per new car growing to more than $540 per vehicle in 2018.

Wireless Comm—Application-Specific Analog is forecast to grow 23% in 2018, as the world becomes increasingly dependent on the Internet and demand for wireless connectivity continues to rise. Similarly, demand for medical/health electronics systems connectivity using the Internet will help the market for Industrial/Other Application-Specific Analog outpace total IC market growth in 2018.

Among the seven categories showing better than total IC market growth this year, three are forecast to be among the largest of all IC product categories in terms of dollar volume. DRAM (#1 with $101.6 billion in sales), NAND Flash (#2 with $62.6 billion), Computer and Peripherals—Special Purpose Logic (#4 with $27.6 billion) prove that big markets can still achieve exceptional percentage growth.

Figure 1

TowerJazz, the global specialty foundry, today provided further details on its 13th annual U.S. Technical Global Symposium (TGS) to be held on November 7, 2018 at the Hilton Santa Clara, CA. During TGS, the company will share its vision on industry megatrends: “Wireless Everything, Smart Everything, Green Everything” – and the means by which its analog specialty portfolio helps customers to differentiate their technology solutions.

The event will commence with TowerJazz CEO, Russell Ellwanger, who will share plans with respect to the Company’s focus on “full circle value creation,” including strategic growth, technology leadership, and capacity expansion. TowerJazz executives will then share the latest technology roadmap developments of the Company’s RF/high performance analog, CMOS image sensors, power management, and aerospace & defense offerings, in addition to its industry-leading design enablement capabilities.

To view the agenda, focus areas for the technical sessions, and/or register for the event, please visit here.

The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of its seventh annual eBeam Initiative perceptions survey. Industry luminaries representing nearly 40 companies from across the semiconductor ecosystem — including photomasks, electronic design automation (EDA), chip design, equipment, materials, manufacturing and research — participated in this year’s survey. The eBeam Initiative also completed its fourth annual mask makers’ survey with feedback from 10 captive and merchant photomask manufacturers. In addition, Tokyo Electron Ltd. (TEL), a leading global company that provides semiconductor and flat panel display (FPD) production equipment, has joined the eBeam Initiative.

Results from the mask makers’ survey indicate that mask output grew 27 percent compared to last year, while overall mask yields remained steady. At the same time, however, survey results indicate that no progress has been made in reducing mask turnaround time for leading-edge nodes, with several indicators such as mask data prep times and average mask write times on the rise compared to last year. Among the results of the perceptions survey, respondents were optimistic about the state of the photomask market, which grew 4.1 percent in 2017 according to SEMI. Survey respondents predicted the market will increase at a compound annual growth rate (CAGR) of 4.1 percent or more between 2018 and 2020. Confidence and optimism in EUV lithography continue to remain high, while the perceived need for multi-beam mask writing (MBMW) continues to grow. Perceptions on the use of inverse lithography technology (ILT) at the leading edge also increased.

Aki Fujimura, CEO of D2S, the managing company sponsor of the eBeam Initiative, will present the results of the mask makers’ survey in an invited talk this morning at the SPIE Photomask Technology Symposium in Monterey, Calif. In addition, the complete results of both surveys will be discussed by an expert panel tomorrow during the eBeam Initiative’s annual members meeting held in conjunction with the SPIE Photomask Technology Symposium, and will be available for download following the meeting at www.ebeam.org.

Highlights from Mask Makers Survey (data from July 2017 to June 2018)

  • The same 10 participants reported delivering 27 percent more masks in 2018 versus 2017, while overall mask yields remained steady at nearly 94 percent
  • The number of delivered EUV masks also more than doubled compared to last year, with EUV mask yields improving to 72 percent
  • However, no progress appears to have been made in mask turnaround time for leading-edge nodes as indicated by several survey results
  • Mask data prep time remains significantly higher at advanced nodes for another year, at 19 hours this year for 11 to 15-nm ground rules
  • Mask process correction (MPC) is also being introduced at sub-16-nm ground rules, confirmed for the second year in a row
  • The average mask write time for eBeam VSB writers also increased by more than 20 percent compared to last year’s survey, from 6.8 hours to nearly 8.3 hours
  • The highest sensitivity (slowest) resists reported to be used for production masks also increased for both 193i and EUV, contributing to longer mask write times
  • Mask data volumes per layer increased on average compared to last year for both eBeam variable shaped beam (VSB) writers and laser writers, with the highest reported data volume per layer increasing from 2.2 to 3.2 Terabytes for eBeam VSB, and from 30 to 240 Gigabytes (an 8x increase) for laser writers

Highlights from eBeam Initiative Perceptions Survey:

  • 95 percent of respondents predict that the overall mask market will achieve 4.1 percent compound annual growth rate (CAGR) or greater between 2018 and 2020
  • 82 percent of respondents predict that EUV lithography will be used in high-volume manufacturing by 2021, while only 1 percent of respondents predict it will never happen
  • Expectations continue to grow around actinic mask inspection for EUV, with only 5 percent of participants in this year’s survey indicating it will never happen — a drop from 21 percent two years ago
  • Perceptions on the need for MBMW remain strong, with 83 percent of respondents indicating that EUV adoption requires MBMW, and 82 percent of respondents indicating that MBMW will be used in high-volume manufacturing by the end of 2020
  • 60 percent of respondents also indicate that ILT is currently being used for a few critical layers at leading-edge nodes, up from 46 percent in last year’s survey

“First and foremost, I would like to welcome our newest member TEL to the eBeam Initiative,” stated Fujimura. “As a leading process solutions provider to the semiconductor industry, TEL has been at the forefront in tackling many of the industry’s most critical mask and lithography challenges. We look forward to adding their voice to our community, and having their support in our ongoing efforts to educate and promote the importance of eBeam technology.”

Added Fujimura, “Over the years, the annual eBeam Initiative surveys have provided valuable insight into not only the perceptions and conditions of the mask industry today, but also the most pressing challenges facing the mask industry ahead. In this year’s surveys, the substantial increase in the total number of masks delivered, the beginning ramp-up of EUV masks, and continued increases in all factors that influence mask turnaround times for the leading-edge nodes stood out to me as important trends. The overwhelming confidence expressed in the perceptions survey for multi-beam mask writing is a positive sign for the industry, as multi-beam helps with the mask turnaround time issue, particularly for writing with slower resists and with complex mask shapes.”

Global fab equipment spending will increase 14 percent this year to US$62.8 billion and is expected to rise 7.5 percent, to US$67.5 billion, in 2019, marking the fourth consecutive year of spending growth and the highest investment year for fab equipment in the history of the industry, according to the latest World Fab Forecast Report published today by SEMI. Investments in new fab construction are also nearing a record with a fourth consecutive year of growth predicted and capital outlays next year approaching US$17 billion.

Investments for fab technology and product upgrades, as well as for additional capacity, will grow as the emergence of numerous new fabs significantly increases equipment demand, the forecast shows. The World Fab Forecast Report currently tracks 78 new fabs and lines that have or will start construction between 2017 to 2020 (with various probabilities) and will eventually require more US$220 billion in fab equipment (Figure 1). Construction spending for these fabs and lines is expected to reach US$53 billion during this period.

Figure 1: Shows the investment potential of new fabs and lines starting construction between 2017 and 2020.

Korea is projected to lead other regions in fab equipment investments with US$63 billion, US$1 billion more than second-place China. Taiwan is expected to claim the third spot at US$40 billon, followed by Japan at US$22 billion and the Americas at US$15 billion. Europe and Southeast Asia will share sixth place, with investments totaling US$8 billion each. Fully 60 percent of these fabs will serve the Memory sector (the lion’s share will be 3D NAND), and a third will go to Foundry.

Of the 78 fab construction projects starting construction between 2017 and 2020, 59 began construction in the first two years (2017 and 2018), while 19 are expected to begin in the last two years (2019 and 2020) of the tracking period.

Equipping a new fab typically takes one to one and a half years, though some fabs take two years and others longer, depending on various factors as such the company, fab size, product type and region. Approximately half of the projected US$220 billion will be spent from 2017 and 2020, with less than 10 percent invested in 2017 and 2018, nearly 40 percent in 2019 and 2020, and the rest after 2020.

While the US$220 billion estimate is based on current insights of known and announced fab plans, total spending could exceed this level as many companies continue to announce plans for new fabs. Since the last quarterly publication of the report published last quarter, 18 new records – all new fabs – have been added to the forecast. Up-to-date and detailed analysis, with a bottoms-up approach, is available by subscribing to SEMI’s World Fab Forecast Report.

Since its June 1 publication, more than 340 updates have been made to the World Fab Forecast. The report now includes more than 1,200 records of current and future front-end semiconductor facilities from high-volume production to research and development. The report covers data and predictions through 2019, including milestones, detailed investments by quarter, product types, technology nodes and capacities down to fab and project level.

Learn more about the SEMI fab databases at www.semi.org/en/MarketInfo/FabDatabase and www.youtube.com/user/SEMImktstats.

By Walt Custer

Global economy

Manufacturing activity continues to expand – but at a slowing pace (Chart 1). The Global PMI was 52.5 in August, down from 52.8 in July and its recent high of 54.5 in December. PMI values >50 indicate an expansion.

World manufacturing growth has slowed but its growth rate varies significantly by region. Chart 2 compares the PMI values over time for the World, USA, Europe and China. Recently China and Europe have registered slower growth but U.S. growth is expanding (based on the Institute for Supply Management’s PMI). How long U.S. manufacturing will continue to accelerate remains to be seen. Geopolitical issues abound.

Semiconductor industry

In the semiconductor industry both semiconductors and SEMI capital equipment continued to register double-digit growth in July (Chart 3), but these growth rates are now moderating. In July, World semiconductor shipments were up 17.4 percent and SEMI capital equipment sales rose 13.9 percent on a 3-month growth basis.

However, SEMI equipment growth rates also vary widely by region. Per Chart 4, China growth is accelerating, Taiwan and South Korea are contracting, and Europe and the USA are still expanding but at slower rates.

Timely World and regional industry information is key to understanding present and future business conditions and this data requires careful watching in these fast-changing times.

Walt Custer of Custer Consulting Group is an analyst focused on the global electronics industry.

Originally published on the SEMI blog.

Japan is at the heart of the semiconductor industry as the era of artificial intelligence (AI) dawns. SEMICON Japan 2018 will highlight AI and SMART technologies in Japan’s industry-leading event. Registration is now open for SEMICON Japan, Japan’s largest global electronics supply chain event, December 12-14 at Tokyo Big Sight in Tokyo.

Themed “Dreams Start Here,” SEMICON Japan 2018 reflects the promise of AI, Internet of Things (IoT) and other SMART technologies that are shaping the future. Japan is positioned to help power a semiconductor industry expansion that is enabling this new path ahead, supplying one-third of the world’s semiconductor equipment and half of its chip IC materials.

According to VLSI Research, seven of the world’s top 15 semiconductor equipment manufacturers in 2017 are headquartered in Japan. In the semiconductor materials market, Japanese companies dominate silicon wafers, photoresists, sputtering targets, bonding wires, lead frames, mold compounds and more. For SEMICON Japan visitors, the event is the ideal platform for connecting with Japan’s leading suppliers.

The SMART Application Zone at SEMICON Japan will once again connect SMART industries with the semiconductor supply chain to foster collaboration across the electronics ecosystem.

SEMICON Japan Keynotes

SEMICON Japan opening keynotes will feature two young leaders of Japan’s information and communications technology (ICT) industry sharing their vision for the industry:

Motoi Ishibashi, CTO of Rhizomatiks, will discuss the latest virtual and mixed reality technologies. Rhizomatiks, a Japanese media art company that staged the Rio Olympic Games closing ceremony, will orchestrate the opening performance at SEMICON Japan 2018. The company is dedicated to creating large-scale commercial projects combining technology with the arts.

Toru Nishikawa, president and CEO at Preferred Networks, will explore computer requirements for enabling deep learning applications. Preferred Networks, a deep-learning research startup, is conducting collaborative research with technology giants including Toyota Motors, Fanuc, NVIDIA, Intel and Microsoft.

Registration

For more information and to register for SEMICON Japan, visit www.semiconjapan.org/en/. Registration for the opening keynotes and other programs will open October 1.

Worldwide semiconductor manufacturing equipment billings reached US$16.7 billion in the second quarter of 2018, 1 percent lower than the previous record quarter and 19 percent higher than the same quarter a year ago, SEMI, the global industry association representing the electronics manufacturing supply chain, reported today.

The data are gathered jointly with the Semiconductor Equipment Association of Japan (SEAJ) from more than 95 global equipment companies that provide monthly data. The quarterly billings data by region in billions of U.S. dollars, quarter-over-quarter growth and year-over-year rates by region are as follows:
2Q2018
1Q2018
2Q2017
2Q18/1Q18
(Qtr-over-Qtr)
2Q18/2Q17
(Year-over-Year)
Korea
4.86
6.26
4.79
-22%
2%
China
3.79
2.64
2.51
44%
51%
Japan
2.28
2.13
1.55
7%
47%
Taiwan
2.19
2.27
2.76
-4%
-21%
North America
1.47
1.14
1.23
29%
20%
Europe
1.18
1.28
0.66
-7%
80%
Rest of World
0.96
1.27
0.62
-24%
56%
Total
16.74
16.99
14.11
-1%
19%

Source: SEMI (www.semi.org) and SEAJ, September 2018

The Equipment Market Data Subscription (EMDS) from SEMI provides comprehensive market data for the global semiconductor equipment market.

SEMI announced today the October 9 deadline for presenters to submit abstracts for the annual SEMI Advanced Semiconductor Manufacturing Conference(ASMC). ASMC, May 6-9, 2019, in Saratoga Springs, New York, will feature technical presentations of more than 90 peer-reviewed manuscripts covering critical process technologies and fab productivity.

ASMC 2019 will feature keynotes, a panel discussion, networking events, technical sessions on advanced semiconductor manufacturing, and tutorials. The conference will also feature a special student poster session to highlight student projects related to semiconductor manufacturing.

Selected speakers will present to IC manufacturers, equipment manufacturers, materials suppliers, chief technology officers, operations managers, process engineers, product managers and academia. All technical papers will be published by IEEE, and authors also may receive an invitation to publish their papers in a special section for ASMC 2019 to be featured in IEEE Transactions on Semiconductor Manufacturing. Technical abstracts are due October 9, 2018, and can be submitted here. 

ASMC 2019 will cover the following topics:

  • Advanced Equipment Processes and Materials
  • Advanced Metrology
  • Advanced Equipment Processes and Materials
  • Advanced Patterning / Design for Manufacturability
  • Advanced Process Control
  • Contamination Free Manufacturing
  • Big Data Management and Mining
  • Defect Inspection and Reduction
  • Discrete and Power Devices
  • Enabling Technologies and Innovative Devices
  • Equipment Reliability and Productivity Enhancements
  • Factory Automation
  • The Fabless Experience
  • Green Factory
  • Industrial Engineering
  • Lean Manufacturing
  • MOL and Junction Interfaces
  • Smart Manufacturing
  • Yield Enhancement/Learning
  • Yield Methodologies
  • 3D Packaging and Through Silicon Via

ASMC, in its 30th year, continues to fill a critical need for the industry, providing a venue for professionals to network, learn and share knowledge about semiconductor manufacturing best practices.

Details on how to upload abstracts can be found here. To learn more about the conference and the selection process, please contact Margaret Kindling at [email protected] or call 1.202.393.5552.   

Papers co-authored by device manufacturers, equipment or materials suppliers, and/or academic institutions that demonstrate innovative, practical solutions for advancing semiconductor manufacturing are highly encouraged.

ASMC is organized by SEMI Americas to connect more than 2,000 member companies and 1.3 million professionals worldwide to advance the technology and business of electronics manufacturing

By Michael Droeger

Over the past three decades, most of the world’s innovations have centered largely on business models and involved iterative advances of existing technologies, with none matching the global impact of the top 10 semiconductor industry discoveries and advances, Dr. Morris Chang, founder of TSMC and the IC foundry model, said at SEMICON Taiwan 2018 this week.

Few have as clear a perspective on the transformative power of semiconductors as Dr. Chang, founder of TSMC and father of the IC foundry model. Keynoting the IC60 Master Forum celebrating the 60th anniversary of the invention of the integrated circuit (IC), Dr. Chang listed what he considers the 10 key semiconductor industry innovation milestones since 1948:

1. Invention of the transistor by Shockley, Bardeen, and Brattain – 1948

2. Silicon transistor – 1954

3. Integrated circuit – 1958

4. Moore’s Law – 1965

5. MOS technology

  1. MOS FET – 1964
  2. Silicon gate – 1967
  3. CMOS  – 1970

6. Memory

  1. DRAM – 1966
  2. Flash – 1967

7. Outsourced assembly and test (OSAT) – 1960s

8. Microprocessor – 1970

9. VLSI systems design – 1970-1980

  1. IP and design tools – 1980-present

10. Foundry model – 1985

Among the most consequential semiconductor advances may be yet to come, Dr. Chang said, citing innovations including artificial intelligence (AI) and machine learning, new device architectures, Extreme Ultraviolet lithography (EUV), 2.5D/3D packaging, and new materials such as graphene and carbon nanotubes.

Dr. Chang argued that because bringing an innovation into production is immensely more expensive than proving a theory in a lab, innovators are not always the ones to implement and benefit from their novel ideas. Today, innovation costs are skyrocketing, driving more consolidation across the supply chain.

Michael Droeger is director of marketing at SEMI.

Originally published on the SEMI blog.