Category Archives: Manufacturing

EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it is increasing its focus on bringing its high-volume manufacturing process solutions and services to the biotechnology and medical device market. EVG products supporting this market include the company’s substrate bonding, hot-embossing, micro contact printing and UV-based nanoimprint lithography (NIL) systems. In addition, EVG will offer its world-class applications support, rapid prototyping and pilot-line production services. Customers in the biotechnology and medical markets can now leverage these patterning and sealing solutions–which have been production-proven in other industrial markets such as semiconductors, MEMS and photonics–for volume production of next-generation biotechnology devices featuring micrometer or nanometer-scale patterns and structures on larger-format substrates.

EV Group nanoimprint lithography solutions enable parallel processing of biotechnology and medical devices on large-area substrates.

EV Group nanoimprint lithography solutions enable parallel processing of biotechnology and medical devices on large-area substrates.

Over the past several decades, miniaturization of biotechnology devices has significantly improved clinical diagnostics, pharmaceutical research and analytical chemistry. Modern biotechnology devices–such as biomedical MEMS (bioMEMS) for diagnostics, cell analysis and drug discovery–are often chip-based and rely on close interaction of biological substances at the micro- and nanoscale. According to the market research and strategy consulting firm Yole Développement, an increasing number of healthcare applications are using bioMEMS components, while the bioMEMS market is expected to triple from US$2.7 billion in 2015 to US$7.6 billion in 2021. Microfluidic devices will represent the majority (86 percent) of the total bioMEMS market in 2021, driven by applications such as Point-of-Need testing, clinical and veterinary diagnostics, pharmaceutical and life science research, and drug delivery*.

Precise and cost-effective micro-structuring technologies are essential to successfully commercialize these products in a rapidly growing market that has stringent requirements and high regulatory hurdles. Traditional process approaches such as injection molding are often unable to produce the extremely small structures and surface patterns with the precision, quality and repeatability increasingly required for these demanding applications, or they require extensive effort in process development. At the same time, solutions are needed to scale up from discrete production of devices to batch processing of multiple devices on a single substrate in order to achieve the economies of scale required to commercialize these products.

NIL has evolved from a niche technology to a powerful high-volume manufacturing method that is able to produce a multitude of structures of different sizes and shapes on a large scale–such as highly complex microfluidic channels and surface patterns–by imprinting either into a biocompatible resist or directly into the bulk material. In addition to structuring technologies, sealing and encapsulation is a central process for establishing confined microfluidic channels. Thus, bonding of different device layers, capping layers or interconnection layers is a key process that can be implemented together with NIL in a cost-effective large-area batch process. As the pioneer as well as market and technology leader in NIL and wafer bonding, EVG is leading the charge in supporting the infrastructure and growth of the biotechnology market by leveraging its products for use in biotechnology applications.

EVG’s NIL solutions can produce a wide range of small structures (from hundreds of micrometers down to 20 nm) on a variety of substrate materials used in biotechnology applications, including glass, silicon and a variety of polymers (e.g., COC, COP, PMMA and PS). Each EVG NIL solution is uniquely suited for different production applications. For example, hot-embossing allows precise imprinting of larger structures as well as combinations of micro- and nanostructures, and is superior when replicating high-aspect ratio features or when using very-thin substrates. UV-NIL provides very-high precision, pattern fidelity and throughput in the nanometer-range. Micro contact printing, which is another NIL option, can transfer materials such as biomolecules onto a substrate in a distinct pattern.

With its established wafer-scale bonding equipment, EVG can also offer sealing and bonding processes that are well-aligned with NIL structuring technologies. A variety of different bonding options are available, ranging from advanced room-temperature bonding techniques to plasma activated bonding as well as high-quality hermetic sealing and vacuum encapsulation. Examples of typical solutions include EVG’s thermal bonding equipment for glass and polymer substrates, which provides excellent results by enabling high-pressure and temperature uniformities over large areas. EVG also offers its room-temperature selective adhesive transfer technology, which eases incorporation of bio-molecules prior to the encapsulation of the device.

“EVG has a long history of providing products and solutions for biomedical R&D, having installed the first hot embossing system for emerging bioMEMS and microfluidic research applications more than 15 years ago,” stated Dr. Thomas Uhrmann, director of business development at EV Group. “The knowledge that EVG has built up in this space coupled with our experience in bringing innovative technologies into volume production in other markets has positioned us well to provide proven high-volume manufacturing processes and services to the bio-medical industry to support the production of next-generation biotechnology devices.”

In addition to equipment and process solutions, EVG also offers prototyping and pilot-line production services to customers out of its cleanroom facilities at its corporate headquarters in Austria as well as its subsidiaries in North America and Japan.

Synopsys, Inc. (Nasdaq:  SNPS) today announced a collaboration with TSMC to complete the certification for its 16-nanometer (nm) FinFET Compact (16FFC) process for a suite of Synopsys’ digital, custom and signoff tools from the Galaxy Design Platform. A key result of the certification is that Synopsys’ Custom Compiler solution is supported with TSMC’s 16FFC Process Design Kits (PDKs) through the iPDK standard. With multiple production designs for TSMC’s 16FFC process already underway, the tool certifications enable mutual customers to lower costs and increase reliability with TSMC’s FinFET technology.

The rapid adoption of FinFET technology and increasing functionality for automotive design applications is resulting in higher current densities and, therefore, more wires susceptible to electromigration (EM) effects, such as voids and short circuits. Additionally, the thermal profile of FinFET technology affects the temperature of surrounding metal interconnects, known as self-heating effect (SHE), which affects the possibility of EM failures over time. To address these challenges, TSMC enhances circuit simulation models that assess the impact of SHE on device reliability mechanisms, such as hot-carrier injection (HCI) and bias-temperature instability (BTI). Synopsys supports the new models with the latest versions of its popular HSPICE®, CustomSim™ and FineSim® circuit simulators. The enhanced reliability simulation solution enables designers to model circuit performance degradation over time – a key step toward improving long-term automotive design reliability.

To support TSMC’s 16FFC process, a suite of Synopsys’ digital, custom and signoff tools from the Galaxy platform are validated to handle enhanced design rules and reliability requirements for targeted applications, such as mobile, Internet of Things (IoT) and automotive. The certified tools deliver routing rules, physical verification runsets, signoff-accurate extraction technology files, statistical timing analysis that correlates with SPICE and interoperable process design kits (iPDKs) for the 16FFC process.

“The jointly developed enhancements for automotive design reliability and tool certification for TSMC’s 16FFC process are another significant milestone of the long-term collaboration between Synopsys and TSMC,” said Bijan Kiani, vice president of product marketing of the Design Group at Synopsys. “The latest enhancements and certification for custom, digital and signoff flows are enabling our mutual customers to deliver lower cost and higher reliability for their innovative designs in many application areas such as automotive, IoT and mobile.”

“Through our multi-year collaboration with Synopsys, we are now jointly delivering significant enhancements to improve design reliability for key applications including automotive ADAS and infotainment,” said Suk Lee, senior director of TSMC’s Design Infrastructure Marketing Division. “In addition, tool certification for TSMC’s 16FFC process signals to our mutual designer community that the Galaxy Design Platform tools are ready to be used with our 16FFC process for the development of their next-generation projects.”

Key Synopsys tools certified by TSMC for their 16FFC process include:

  • IC Compiler IITM place and route solution
  • IC Validator signoff physical verification
  • StarRC™ extraction tool
  • PrimeTime® timing signoff solution
  • Custom Compiler custom design solution
  • PrimeRail and CustomSim reliability analysis
  • NanoTime custom timing analysis
  • HSPICE, CustomSim and FineSim simulation

EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, and Leti, an institute of CEA Tech, announced today that Leti has ordered a HERCULES NIL track system from EV Group. The HERCULES NIL system will be installed in Leti’s cleanroom facility in Grenoble, where it will augment the process-development and demonstration capabilities available to participants in the collaborative EVG-Leti INSPIRE program.

hercules nil

More than an industrial partnership to develop NIL process solutions, the INSPIRE program was launched by Leti and EVG in June 2015 to demonstrate the cost-of-ownership benefits of NIL for a wide range of application areas, such as photonics, plasmonics, lighting, photovoltaics, wafer-level optics and bio technology. Through INSPIRE, Leti and EVG are supporting the development of new applications from the feasibility-study stage to the first manufacturing steps on EVG platforms, as well as transferring integrated process solutions to their industrial partners. The result of this effort is to significantly lower the barriers for adopting NIL technology for use in manufacturing novel products.

“Nanoimprint lithography has shown significant potential as a low-cost, high-resolution patterning solution for emerging and growing applications outside the semiconductor industry,” said Laurent Pain, patterning program manager, Leti. “The INSPIRE program launched by Leti and EVG is designed to accelerate the adoption of this promising technology in high-volume manufacturing. Installing this tool supports our goal of expanding and accelerating the scope of INSPIRE and demonstrating the benefits of this versatile, powerful nano-patterning technology.”

“We are extremely pleased with the success of the INSPIRE program since Leti and EVG launched it one year ago,” stated Markus Wimplinger, corporate technology development and IP director, EV Group. “To date, this program is supporting the development of NIL solutions for several customers thanks to the combined expertise and capabilities provided by both organizations. With the addition of EVG’s HERCULES NIL track system–which has already been installed in multiple high-volume manufacturing sites–we expect INSPIRE’s success to continue to grow.”

HERCULES NIL is a fully integrated track system that combines cleaning, resist coating and baking pre-processing steps with EVG’s proprietary SmartNIL large-area NIL process in a single platform. It can imprint structures in sizes ranging from tens of nanometers up to several micrometers while offering unmatched throughput (40 wph for 200-mm wafers). The system is built on a highly configurable and modular platform that accommodates a variety of imprint materials and structure sizes–providing a high degree of flexibility in addressing customers’ manufacturing needs. The fully integrated approach also minimizes the risk of particle contamination.

Solid State Technology announced today that its premier semiconductor manufacturing conference and networking event, The ConFab, will be held at the iconic Hotel del Coronado in San Diego on May 14-17, 2017. A 30% increase in attendance in 2016 with a similar uplift expected in 2017, makes the venue an ideal meeting location as The ConFab continues to expand.

    

For more than 12 years, The ConFab, an invitation-only executive conference, has been the destination for key industry influencers and decision-makers to connect and collaborate on critical issues.

“The semiconductor industry is maturing, yet opportunities abound,” said Pete Singer, Editor-in-Chief of Solid State Technology and Conference Chair of The ConFab. “The Internet of Things (IoT) is exploding, which will result in a demand for “things” such as sensors and actuators, as well as cloud computing. 5G is also coming and will be the key technology for access to the cloud.”

The ConFab is the best place to seek a deeper understanding on these and other important issues, offering a unique blend of market insights, technology forecasts and strategic assessments of the challenges and opportunities facing semiconductor manufacturers. “In changing times, it’s critical for people to get together in a relaxed setting, learn what’s new, connect with old friends, make new acquaintances and find new business opportunities,” Singer added.

Dave Mount

David Mount

Solid State Technology is also pleased to announce the addition of David J. Mount to The ConFab team as marketing and business development manager. Mount has a rich history in the semiconductor manufacturing equipment business and will be instrumental in guiding continued growth, and expanding into new high growth areas.

Mainstream semiconductor technology will remain the central focus of The ConFab, and the conference will be expanded with additional speakers, panelists, and VIP attendees that will participate from other fast growing and emerging areas. These include biomedical, automotive, IoT, MEMS, LEDs, displays, thin film batteries, photonics and advanced packaging. From both the device maker and the equipment supplier perspective, The ConFab 2017 is a must-attend networking conference for business leaders.

The ConFab conference program is guided by a stellar Advisory Board, with high level representatives from GLOBALFOUNDRIES, Texas Instruments, TSMC, Cisco, Samsung, Intel, Lam Research, KLA-Tencor, ASE, NVIDIA, the Fab Owners Association and elsewhere.

Details on the invitation-only conference are at: www.theconfab.com. For sponsorship inquiries, contact Kerry Hoffman at [email protected]. For details on attending as a guest or qualifying as a VIP, contact Sally Bixby at [email protected].

BY DR. BERND DIELACHER, DR. MARTIN EIBELHUBER and DR. THOMAS UHRMANN, EV Group, St. Florian, Austria

Over the past several decades, miniaturization has significantly improved clinical diagnostics, pharmaceutical research and analytical chemistry. Modern biotechnology devices— such as biosensors, fully integrated systems for diagnostics, cell-analysis or drug discovery—are often chip-based and rely on close interaction of biological substances at the micro- and nanoscale. Thus, process technologies that enable the production of surface patterns and integration of fluidic components with small feature sizes are needed (FIGURE 1).

FIGURE 1. Biotechnology devices utilize a variety of structures at the micro- and nanoscale that interact with biological substances.

FIGURE 1. Biotechnology devices utilize a variety of structures at the micro- and nanoscale that interact with
biological substances.

Today’s miniaturized biotechnology devices can be found in numerous applications, including fields related to human health as well as environmental and industrial sciences. For example, chemical sensors and biosensors are commonly used to analyze pH values, levels of electrolytes and blood-gas. Glucose sensors are a prominent example of highly successful commercial devices used for diabetes monitoring, where miniaturization has enhanced the development of implantable chips for continuous glucose level monitoring inside the human body.Fully integrated systems, including micro- and nanopumps for accurate insulin release, have also been shown. In general, such controlled drug delivery systems offer new opportunities for the treatment of common acute and chronic diseases. Moreover, microneedle arrays, which allow minimally invasive and painless delivery of drugs through the skin, neural electrodes for stimulation or monitoring signals inside the brain, or prosthetic devices such as artificial retinas, have also been developed.

Microfluidics plays a key role in the transport and manipulation of biological fluids in biotechnology devices. For example, laminar flow behavior can be overserved, which allows a well-defined control of liquids. Capillary forces can enable fluid flow without the need of active pumps. In addition, short distances reduce diffusion times of molecules, which lead to faster biological reactions. Overall, microfluidic devices offer a high degree of parallelization while using extremely-low-volume samples. Microfluidic devices that perform complete tasks or analysis, usually done in a laboratory, are referred to as lab-on-chip (LOC) devices. Other names include bio-chips or micro-Total-Analysis- Systems (μ-TAS). These systems are used in applications such as in-vitro diagnostics, high-throughput screening, genomics and drug discovery. LOC devices are also ideally suited for point-of-care testing (POCT), where they provide rapid diagnostics at the patient site.

Nanoimprint lithography

To successfully commercialize such products in a fast growing market with stringent requirements and high regulatory hurdles, precise and cost-effective micro- structuring technologies are essential. Nanoimprint lithography (NIL) has evolved from a niche technology to a powerful high-volume manufacturing method that is able to serve today’s needs and overcome the challenges of increasing complexity of microfluidic devices in particular, and biotechnology devices in general. NIL is a patterning technique capable of producing a multitude of different sizes and shapes on a large scale by imprinting either into a biocompatible resist or directly into the bulk material with resolutions down to 20 nm. NIL can be distinguished between three types of imprint technologies: hot-embossing or thermal NIL, UV-NIL, and micro- contact printing (μ-CP).

Hot-embossing is a cost-effective and relatively simple process, well suited for the fabrication of polymer microfluidic devices with very high replication accuracy of small features down to 50 nm (FIGURE 2). A polymer sheet or spin-on-polymer is heated above its glass transition temperature, transforming the material into a viscous state. A stamp containing the negative copy of the struc- tures is then pressed into the polymer with sufficient force to conformally mold the polymer. De-embossing is done after cooling the substrate below a certain temperature where the material retains its shape when removing the stamp. During hot-embossing, the structure is trans- ferred by displacement of the viscous material. The process is characterized by short flow paths of the material, moderate flow velocities and imprinting temperatures. Residual stress is therefore low, especially when comparing the process to injection molding, which is an alternative production technique for microfluidics.

FIGURE 2: a) 200-μm wide microfluidic channels and b) 10- μm pillar arrays with high aspect ratios (7:1) fabricated by hot- embossing (Courtesy of National Research Council Canada). c) Schematic drawing of hot-embossing process flow.

FIGURE 2: a) 200-μm wide microfluidic channels and b) 10- μm pillar arrays with high aspect ratios (7:1) fabricated by hot- embossing (Courtesy of National Research Council Canada). c) Schematic drawing of hot-embossing process flow.

FIGURE 2: a) 200-μm wide microfluidic channels and b) 10- μm pillar arrays with high aspect ratios (7:1) fabricated by hot- embossing (Courtesy of National Research Council Canada). c) Schematic drawing of hot-embossing process flow.

Because of the much higher process temperatures and pressures associated with injection molding, final products produced by this process usually experience higher internal residual stress, which easily results in significant deformation, such as warpage and shrinkage. In addition, a surface solidifi- cation layer is formed at the interface of the cold mold during the injection of the high-temperature molten polymer. This effect significantly influences the replication accuracy and optical quality. Extensive effort in process development and simulation is therefore often necessary for injection molding to replicate small features in an accurate manner. In contrast, hot-embossing allows precise replication of micro- and nanostructures with less effort and is superior when replicating high-aspect ratio features or when using very-thin substrates. Structures with high-aspect ratios are often needed in microfluidic chips for filtration elements, particle separation or cell sorting.

The ability to use very thin substrates enables the patterning of spin-on-polymer layers on top of other materials or even roll-to-roll embossing using polymer foils for very-high-throughput production. Parallel wafer-based batch processing also enables fabrication of typical-sized microfluidic chips with throughputs compa- rable to or even higher than injection molding or similar techniques. Since master stamps for hot-embossing do not need to withstand the high temperatures and forces required for mold inserts for injection molding, they are less expensive to produce. Therefore, hot-embossing is also a well suited technology for R&D and allows easier design changes in volume-production. UV-NIL refers to a technique where a transparent stamp is pressed into a photo-curable resist and cross-linked by UV-light while still in contact (FIGURE 3). In biotechnology applications, the resist is usually coated onto silicon or glass substrates. Unlike hot-embossing, the UV-NIL stamp is brought in contact with the resist using minimum force to conformally join the stamp and substrate. The different mechanisms of curing and stamp attachment account for different advantages and fields of application of the respective technologies.

FIGURE 3: (a) 100-nm grating with residual layer <10 nm imprinted into 90 nm height resist on silicon substrate and (b) 350-nm photonic crystal fabricated by UV-NIL. c) Schematic drawing of UV-NIL process flow.

FIGURE 3: (a) 100-nm grating with residual layer

UV-NIL provides very-high-alignment accuracy, pattern fidelity, and throughput whereas hot-embossing is capable of imprinting higher aspect ratios and larger structures in the upper micron range as well as combinations of micro- and nanostructures. UV-NIL offers additional opportunities for biotechnology devices where features with ultra- high precision are needed. Examples include optical-based biosensors that often rely on noble metal nanostructures that influence properties of coupled light upon the binding of molecules onto the nanostructures.Regardless of what the sensing principle is based on (e.g. localized surface plasmon resonance or photonic band gaps), small changes in shape and size can significantly alter the properties of the sensing element.

In order to produce nanostructures made of metals, either additive or subtractive processes can be used. The former involves the deposition of a metal layer onto the patterned resist followed by a lift-off process, whereas the latter involves the transfer of the pattern into an underlying metal layer by etching processes. In both cases, the small residual layer must first be removed. Having a uniform residual layer is of high importance, especially for subse- quent etching processes, and can be easily achieved with current equipment over large areas. Imprinted UV-NIL resists can also be used directly as functional layers. After many years of continuous resist development, a broad portfolio of optimized resist materials is available for various bio-applications. Another interesting aspect, especially for microfluidic devices, is the potential of nanostructures to influence surface properties. For example, nanostructures can change the surface behavior from hydrophilic to hydrophobic, which can be used to locally influence the fluid flow.

While UV-NIL is ideally suited for fabricating very small features, it is not well suited for features larger than several tens of micrometers. In cases where both highly-accurate nanostructures and large microfluidic channels are needed, hot-embossing can be used to imprint the channels on a separate substrate. The two substrates can subsequently be bonded together to produce the final device.

A third NIL option is μ-CP, where a pre-inked stamp is used to transfer materials such as biomolecules onto a substrate in a distinct pattern (FIGURE 4). Local modification of surface chemistry can, for example, be used to guide the growth of neurons on a chip. On the other hand, it can be used for the precise placement of capture molecules in biosensor fabrication. This technique is applicable on all common surfaces, such as silicon, glass or polymers with micro- and nanometer resolution and offers new possibilities for functionalization of biotechnology devices.

FIGURE 4: Bio-functionalized, micro-patterned array
created by micro-contact printing for the detection of protein- protein interactions in live cells. a) Antibody-patterns induce the recruitment of two interacting proteins to micro-patterns, which is detected by fluorescence microscopy. b) Missing interaction of the two candidate proteins leads to homogenous distribution on the functionalized surface. c) Schematic drawing of micro-contact printing process flow. [Images adapted from Schwarzenbacher et al., 2008, Nature Methods; Weghuber et al., 2010, Methods in Enzymology].

FIGURE 4: Bio-functionalized, micro-patterned array
created by micro-contact printing for the detection of protein- protein interactions in live cells. a) Antibody-patterns induce the recruitment of two interacting proteins to micro-patterns, which is detected by fluorescence microscopy. b) Missing interaction of the two candidate proteins leads to homogenous distribution on the functionalized surface. c) Schematic drawing of micro-contact printing process flow. [Images adapted from Schwarzenbacher et al., 2008, Nature Methods; Weghuber et al., 2010, Methods in Enzymology].

Although most current microfluidic devices do not follow the same degree of miniaturization in terms of chip-size compared to the microelectronics industry, large-scale parallel processing has a significant advantage in terms of costs and flexibility (FIGURE 5). Alternative fabrication techniques for microfluidic chips, such as injection molding, are principally serial processes and have limita- tions in up-scaling.Using nanoimprinting,30chipsofthe size of a microscopy slide (25 x 75 mm) can easily fit on a single 300-mm substrate. This format can be considered a good reference for an average- sized microfluidic chip. In terms of throughput, wafer-based batch processing is able to reach similar or better cycle times per device compared to alternative solutions, such as injection molding. UV-NIL has even been introduced on GEN2 substrates (370 x 470 mm). In addition, roll- to-roll processing can reach even higher throughput levels but is restricted to the structuring of flexible foils.

FIGURE 5: Large-area parallel processing offers significant advantages in terms of cost and flexibility. Additional processes, such as electrode fabrication or spotting of reagents, can also be efficiently integrated.

FIGURE 5: Large-area parallel processing offers significant advantages in terms of cost and flexibility. Additional processes, such as electrode fabrication or spotting of reagents, can also be efficiently integrated.

Wafer bonding

NIL has an additional advantage in terms of post- processing. Electrode fabrication, surface treatments or spotting of bio-reagents can be efficiently integrated in a large-area batch. The same is true for sealing and encapsulation, an essential process step for all biotechnology devices. It is usually mandatory to close micro-fluidic channels, to fabricate a hermetic sealing for protection against environmental influences or even to provide packaging that is compatible for implantation into human bodies. In addition, interconnections to the outer world have to be incorporated, such as holes or fluidic connectors. Electronic connections or assembling the device together with an integrated microelectronic chip is also often necessary. Thus, bonding of different device layers, capping layers or interconnection layers is a key process that can be implemented together with NIL in a cost-effective large-area batch process. NIL has an additional advantage of providing a high surface quality that can significantly improve subsequent bonding of polymer devices. Surface roughness, total-thickness variation as well as warpage are usually lower than in devices fabricated by injection molding. In the following section, several well-suited bonding processes for sealing biotechnology devices are discussed (FIGURE 6).

FIGURE 6: Typical bonding options for biotechnology devices that are well suited in combination with NIL processes.

FIGURE 6: Typical bonding options for biotechnology devices that are well suited in combination with NIL processes.

A common requirement in biotechnology applications is optical transparency, at least from one side, since most devices rely on optical readouts. Glass is therefore often used as a capping layer for highly complex devices made of silicon. In such cases, anodic bonding can provide a high-quality hermetic seal, where bonding is achieved by high voltage and heat causing inter-diffusion of ions. Another process for joining glass or polymer devices is thermal bonding using high temperatures and pressures. Special attention has to be paid when using this technique for bonding polymer and, in particular, polymer micro-fluidic devices. Thermal bonding is performed by heating the substrate near or above the glass transition temper- ature, which softens the material. The additional pressure generates sufficient flow of polymer at the interface to achieve intimate contact and inter-diffusion of polymer chains. Pressure is removed after the substrate is cooled down to a specific value below the glass transition temperature. Un-optimized temperature and pressure can easily lead to deformation of microstructures. Plasma as well as UV and ozone treatment can be used to activate the polymer surface, which allows bonding at reduced temperatures and reduces the risk of deformation. Anodic and thermal bonding are interlayer-free processes and therefore do not introduce any additional material to the device.

Adhesive bonding is another process that found widespread use in sealing or encapsulating bio-technology devices. Many biocompatible adhesives are available today and high bond strength can be expected from this technique. Bonding with adhesives can be used to join many different materials. Often liquid adhesives are used, which can be cured thermally or by exposure to UV light. The latter offers a significant advantage that addresses another important issue in many pharmaceu- tical or diagnostic devices where bio-molecules have to be incorporated before sealing the device. UV-curing allows bonding at room-temperature whereas higher temperatures usually lead to denaturation or complete destruction of bio-molecules.

Adhesives usually have to be selectively deposited on the substrate, which can be achieved with μ-contact printing. Similar to bio-molecule printing, an adhesive can be trans- ferred onto the substrate according to the pattern of the stamp. In contrast, however, an adhesive can be spin coated onto a transfer plate, which is then brought into contact with the substrate. By releasing the transfer plate, the adhesive will remain on the heightened structures. This production process is an elegant solution for micro-fluidic devices where micro-channels stay free of adhesive without the need for alignment. With these methods the adhesive can be coated as a thin layer (typically on the order of several microns) with very good uniformity over large areas. Commercially available adhesive tapes offer another solution, which can be easily laminated onto the microfluidic chips either in the form of double-side-adhesive tapes or pressure-sensitive-tapes. By using this process, the tape covers the top of microfluidic channels and can alter chemical or physical parameters of the channels, which can then influence the fluidic behavior or biological function of the device. Due to the availability of a variety of different tapes, however, such influences can be addressed and eliminated in many applications.

Summary

Micro- and nanotechnology combined with biotechnology has the potential to revolutionize many areas of healthcare, agriculture and industrial manufacturing. The market for miniaturized bio-devices is rapidly growing with technologies becoming increasingly complex. For successful translation of these technologies into new products, the availability of fabrication tools is key. Today’s NIL equipment offers a well suited solution, where complexity in design does not necessarily add manufacturing cost. Together with sealing and bonding processes that are well aligned with these structuring techniques, limitations of current fabrication methods can be overcome to enable the production for next-generation biotechnology devices.

Further reading

T. Glinsner and G. Kreindl, “Nanoimprint Lithography,” in Lithography, M. Wang, Ed. InTech, 2010.
T. Glinsner, T. Veres, G. Kreindl, E. Roy, K. Morton, T. Wieser,
C. Thanner, D. Treiblmayr, R. Miller, and P. Lindner, “Fully automated hot embossing processes utilizing high resolution working stamps,” Microelectron. Eng., vol. 87, no. 5–8, pp. 1037–1040, May 2010.
G. Kreindl, T. Glinsner, and R. Miller, “Next-generation lithography: Making a good impression,” Nat. Photonics, vol. 4, no. 1, pp. 27–28, Jan. 2010.

Global growth in the number of “things” connected to the Internet continues to significantly outpace the addition of human users to the World Wide Web. New connections to the “Internet of Things” are now increasing by more than 6x the number of people being added to the “Internet of Humans” each year. Despite the increasing number of connections, IC Insights has trimmed back its semiconductor forecast for Internet of Things system functions over the next four years by about $1.9 billion, mostly because of lower sales projections for connected cities applications (such as smart electric meters and infrastructure). Total IoT semiconductor sales are still expected to rise 19% in 2016 to $18.4 billion, as shown in Figure 1, but the updated forecast first presented in the Update to the 2016 IC Market Drivers Report reduces the market’s compound annual growth rate between 2014 and 2019 to 19.9% compared to the original CAGR of 21.1%. Semiconductor sales for IoT system functions are now expected to reach $29.6 billion in 2019 versus the previous projection of $31.1 billion in the final year of the forecast.

Figure 1

Figure 1

The most significant changes in the new outlook are that semiconductor revenues for connected cities applications are projected to grow by a CAGR of 12.9% between 2014 and 2019 (down from 15.5% in the original forecast) while the connected vehicles segment is expected to rise by a CAGR of 36.7% (up from 31.2% in the previous projection). IoT semiconductor sales for connected cities are now forecast to reach $15.7 billion in 2019 while the chip market for connected vehicle functions is expected to be $1.7 billion in 2019, up from the previous forecast of $1.4 billion.

For 2016, revenues of IoT semiconductors used in connected cities applications are expected to rise 15% to about $11.4 billion while the connected vehicle category is projected to climb 66% to $787 million this year.

Sales of IoT semiconductors for wearable systems have also increased slightly in the forecast period compared to the original projection.  Sales of semiconductors for wearable IoT systems are now expected to grow 22% to about $2.2 billion in 2016 after surging 421% in 2015 to nearly $1.8 billion following Apple’s entry into the smartwatch market in 2Q15.  The semiconductor market for wearable IoT applications is expected to be nearly $3.9 billion in 2019.  Meanwhile, the forecast for IoT semiconductors in connected homes and the Industrial Internet categories remains unchanged.  The connected homes segment is still expected to grow 26% in 2016 to about $545 million, and the Industrial Internet chip market is forecast to increase 22% to nearly $3.5 billion.  The semiconductor forecast for IoT connections in the Industrial Internet is still expected to grow by a CAGR of 25.7% to nearly $7.3 billion in 2019 from $2.3 billion in 2014.

Leading sensors and actuators companies will present the latest trends at the upcoming SEMI European MEMS Summit in Stuttgart on 15-16 September 2016.  Following 2015’s highly successful debut in Milano, the SEMI European MEMS Summit this year moves to Stuttgart. Over 250 attendees, including the industry’s global thought leaders, will discuss challenges, opportunities, and solutions.  A full capacity exhibition with representatives from the full value chain will complement the conference.

The event’s keynote presentations will feature:

  • Bosch Sensortec:  “Smart Connected MEMS Sensors – Enabler for the IoT” by Udo Gomez, CTO
  • STMicroelectronics:  “MEMS Sensors and Actuators – Opportunities and Challenges” by Benedetto Vigna, EVP and GM
  • Qorvo: “BAW and the ‘Edge of Tomorrow’ in Wireless Communication: Innovate, Ramp. Repeat” by Robert Aigner, Senior Director
  • AMKOR: “Sensor in Package – Standard Package Platform for Sensor Fusion and IoT” by Adrian Arcedera, VP

In addition to keynotes, the MEMS Summit’s exceptional speaker line-up includes presentations from ams AG, Bosch, Coventor, Fraunhofer IPMS, GLOBALFOUNDRIES, IHS, Invensas, NXP, Roland Berger, STMicroelectronics, Teledyne DALSA, and Yole Developpement.  The event’s main sessions will address Market and Business, Technology, Internet of Things, Automotive, Consumer, and Wearable Electronics. Promising start-ups Innoluce, USound, Polight and Enerbee will pitch their innovative solutions in a brand new session.

The Summit benefits from strong support from within the industry including Platinum Sponsor Bosch Sensortec; Gold Sponsors ASE Group, STMicroelectronics, and SUSS MicroTec; Silver Sponsors Applied Materials, EV Group, LAM Research, and SPTS. Other sponsors include AMKOR Technology, JSR Micro, Materion, Trymax, and VAT.

For more information and registration, please visit www.semi.org/eu/EuropeanMEMSSummit

Driven by rising demand for thinner wafers and stronger die, dicing technology is evolving.

“Reaching more than US$100 million in 2015, the dicing equipment market will double by 2020-2021,” announced Yole Développement (Yole) (Source: Thin Wafer Processing & Dicing Equipment Market report, Yole Développement, May 2016). Yet at the same time thin wafers are creating new challenges of significant interest in the dicing equipment industry such as die breakage, chipping, low die strength, handling issues and dicing damage.

Yole’s Technology & Market Analyst, Amandine Pizzagalli, is pleased to give her vision of the dicing technologies, market forecast and competitive landscape during the webcast “Plasma Dicing for Next Generation Ultra Small and Ultra Thin Die” organized by SPTS Technologies, an Orbotech company. This webcast will take place on September 14. To register click PLASMA DICING.

Today, the most common dicing technology applied across memory, logic, MEMS, RFID and power devices is mechanical dicing, also known as blade dicing. 

“Blade dicing represents more than 80% of the dicing brand equipment business in terms of dicing tools and stealth dicing 20%,” explained Amandine Pizzagalli from Yole.

However, companies are showing a growing need for thinner wafers and smaller devices in general and Yole sees a trend towards adopting alternative dicing technologies. These include stealth dicing and plasma dicing based on deep reactive ion etching technology. Yole’s analysts details the plasma dicing market per application:

  • Memory specifically has predominantly relied on a combination of blade and laser dicing applied together to singulate complex stacks. Using only blade dicing on top layers leads to delamination issues because of the high metal density. However, it’s difficult to safely singulate 50 µm thin wafers even with laser dicing and this could allow plasma dicing to enter this area. “Even if the philosophy of the designers is changing, memories manufacturers are still the most conservative”, details Amandine from Yole.
  • In MEMS devices blade dicing is largely applied for singulating the ASIC, capping and MEMS sensors. However, exposure to water from the process can contaminate some sensors and destroy sensitive MEMS structures, example in MEMS microphones. In such cases, stealth dicing has been already adopted in large volume production. Plasma dicing has also been adopted in low volume production today for MEMS devices.
  • In parallel, the RFID is a growing market segment: plasma dicing is already in production but the adoption rate is still small. According to Yole’s analysts, a fast growth for plasma dicing especially for RFID devices is expected. Indeed plasma dicing has the ability to reduce die fragility, boost die strength, increase the number of chips per wafer and thus reduce Cost Of Ownership of equipment overall.

“As die sizes continue to shrink, singulation by plasma etching offers considerable benefits for die quality and strength as compared to traditional dicing solutions,” stated Richard Barnett, Etch Product Manager at SPTS Technologies, an Orbotech company. And he adds: “Ultra-small and ultra-thin devices like RFID chips or fragile devices like MEMS are more susceptible to damage from the vibration and chipping caused by mechanical saws, or from the heat caused by lasers.”

Under its new thin wafer & dicing equipment market report, the “More than Moore” market research and strategy consulting company is analyzing the competitive landscape: the current market is today controlled by DISCO and Accretech, which today claim market shares of almost 80% focused on blade dicing and stealth dicing, respectively:

  • DISCO leads the blade dicing market and offers a large product portfolio including stealth dicing and laser ablation. They have also a partnership with Plasma-Therm which gives them access to the complete range of dicing technologies: Yole’s analysts had the opportunity to discuss the market, its evolution and challenges with Abdul Lateef, CEO, and Thierry Lazerand, Business Development Director, of Plasma-Therm. To discover this interview, click Plasma-Therm solution.
  • Accretech leads the stealth dicing market offering.
  • ASM Pacific is a strong player in laser ablation, especially because their process does not lead to contamination issues compared to standard laser ablation technology.

During SPTS Technologies webcast, Amandine Pizzagalli will describe the today’s competitive landscape of the key dicing technologies across MEMS devices, power devices, CMOS image sensors, and RFID devices, highlighting her major findings on the evolution and trends of the dicing technologies.

These results are part of Yole’s report entitled Thin Wafer Processing & Dicing Equipment Market. Under this analysis, Yole presents a comprehensive overview of the key dicing technologies benchmarks in terms of feature requirements. This report includes insights into the number of tools, broken down by wafer size, by application and by dicing technology… A full description of the report is available on i-micronews.com, manufacturing reports section.

In parallel, SPTS Technologies speaker, Richard Barnett also proposes an overview of the latest advances in plasma dicing. During his talk, Richard will highlight the latest data illustrating how processing routes affect die strength, share experiences with different types of tapes and other die features such as solder balls. SPTS Technologies will share details of the latest equipment which is now available for plasma dicing wafers up to 300mm (on 400mm tape frames) for full production applications.

Last March, the artificial intelligence (AI) program AlphaGo beat Korean Go champion LEE Se-Dol at the Asian board game.

“The game was quite tight, but AlphaGo used 1200 CPUs and 56,000 watts per hour, while Lee used only 20 watts. If a hardware that mimics the human brain structure is developed, we can operate artificial intelligence with less power,” points out Professor YU Woo Jong.

In the junctions (synapses) between neurons, signals are transmitted from one neuron to the next. TRAM is made by a stack of different layers: A semiconductor molybdenum disulfide (MoS2) layer with two electrodes (drain and source), an insulating hexagonal boron nitride (h-BN) layer and graphene layer. This two-terminal architecture simulates the two neurons that made up to the synaptic structure. When the difference in the voltage of the drain and the source is sufficiently high, electrons from the drain electrode tunnel through the insulating h-BN and reach the graphene layer. Memory is written when electrons are stored in the graphene layer, and it is erased by the introduction of positive charges in the graphene layer. CREDIT: IBS

In the junctions (synapses) between neurons, signals are transmitted from one neuron to the next. TRAM is made by a stack of different layers: A semiconductor molybdenum disulfide (MoS2) layer with two electrodes (drain and source), an insulating hexagonal boron nitride (h-BN) layer and graphene layer. This two-terminal architecture simulates the two neurons that made up to the synaptic structure. When the difference in the voltage of the drain and the source is sufficiently high, electrons from the drain electrode tunnel through the insulating h-BN and reach the graphene layer. Memory is written when electrons are stored in the graphene layer, and it is erased by the introduction of positive charges in the graphene layer. CREDIT: IBS

In collaboration with Sungkyunkwan University, researchers from the Center for Integrated Nanostructure Physics within the Institute for Basic Science (IBS), have devised a new memory device inspired by the neuron connections of the human brain. The research, published in Nature Communications, highlights the devise’s highly reliable performance, long retention time and endurance. Moreover, its stretchability and flexibility makes it a promising tool for the next-generation soft electronics attached to clothes or body.

The brain is able to learn and memorize thanks to a huge number of connections between neurons. The information you memorize is transmitted through synapses from one neuron to the next as an electro-chemical signal. Inspired by these connections, IBS scientists constructed a memory called two-terminal tunnelling random access memory (TRAM), where two electrodes, referred to as drain and source, resemble the two communicating neurons of the synapse. While mainstream mobile electronics, like digital cameras and mobile phones use the so-called three-terminal flash memory, the advantage of two-terminal memories like TRAM is that two-terminal memories do not need a thick and rigid oxide layer. “Flash memory is still more reliable and has better performance, but TRAM is more flexible and can be scalable,” explains Professor Yu.

TRAM is made up of a stack of one-atom-thick or a few atom-thick 2D crystal layers: One layer of the semiconductor molybdenum disulfide (MoS2) with two electrodes (drain and source), an insulating layer of hexagonal boron nitride (h-BN) and a graphene layer. In simple terms, memory is created (logical-0), read and erased (logical-1) by the flowing of charges through these layers. TRAM stores data by keeping electrons on its graphene layer. By applying different voltages between the electrodes, electrons flow from the drain to the graphene layer tunnelling through the insulating h-BN layer. The graphene layer becomes negatively charged and memory is written and stored and vice versa, when positive charges are introduced in the graphene layer, memory is erased.

IBS scientists carefully selected the thickness of the insulating h-BN layer as they found that a thickness of 7.5 nanometers allows the electrons to tunnel from the drain electrode to the graphene layer without leakages and without losing flexibility.

Flexibility and stretchability are indeed two key features of TRAM. When TRAM was fabricated on flexible plastic (PET) and stretachable silicone materials (PDMS), it could be strained up to 0.5% and 20%, respectively. In the future, TRAM can be useful to save data from flexible or wearable smartphones, eye cameras, smart surgical gloves, and body-attachable biomedical devices.

Last but not least, TRAM has better performance than other types of two-terminal memories known as phase-change random-access memory (PRAM) and resistive random-access memory (RRAM).

According to the latest market study released by Technavio, the global micro-electro-mechanical-systems (MEMS) market is expected to reach USD 20.26 billion by 2020, growing at a CAGR of nearly 12%.

This research report titled ‘Global MEMS Market 2016-2020’ provides an in-depth analysis of the market in terms of revenue and emerging market trends. To calculate the market size, the report considers revenue generated from the sales of MEMS. The report also presents the vendor landscape and a corresponding detailed analysis of top vendors in the market, as well as other prominent vendors.

MEMS are miniaturized devices and structures that are made using the techniques of microfabrication. These combine mechanical, optical, and fluidic elements with electronics. The size of the devices can range from less than one micron up to a number of millimeters. These devices are integrated with a number of devices such as smartphones, tablets, wearables, vehicles, medical devices, and industrial devices for carrying out different types of automated functions. Consumer electronics is the largest market for MEMS. IoT will boost up the MEMS demand, as a large number of MEMS would be required for smart homes, building and industrial automation, and smart grid applications.

Technavio’s hardware and semiconductor analysts categorize the market into three major segments by end user. They are:

  • Automotive
  • Consumer electronics
  • Industrial

Global MEMS market for consumer electronic segment

The consumer electronic segment was valued at USD 5.83 billion in 2015 and will reach USD 10.84 billion by 2020, growing at a CAGR of over 13% during the forecast period. MEMS are integrated into consumer electronics such as smartphones, tablets, cameras, gaming consoles, and wearables. The features such as display control, motion control, navigation, and gesture recognition are enabled by MEMS. Therefore, consumer electronics are integrated with MEMS. The global MEMS market for consumer electronics will primarily be driven by the increase in demand for smartphones. This is due to the decreasing cost of smartphones, which, in turn, boosts the market for MEMS.

According to Sunil Kumar Singh, a lead sensors research analyst from Technavio, “With the declining ASPs and increasing benefits such as low space and high accuracy, the demand for MEMS is increasing. MEMS are small enough to be soldered directly onto the circuit boards. This provides technology with a price advantage.”

Global MEMS market for automotive segment

The automotive segment was valued at USD 3.3 billion in 2015 and will reach USD 5.22 billion by 2020, growing at a CAGR of almost 10% during the forecast period. Government regulations and consumer awareness campaigns such as the Global New Car Assessment Program (NCAP) are driving the demand for MEMS in the automotive segment. Global NCAP demands the integration of minimum vehicle safety standards for both crash protection and crash avoidance in all new cars sold worldwide by 2020. This requires the installation of different types of MEMS in vehicles. MEMS provide safety features such as airbag systems, vehicle security systems, inertial brake lights, headlight levelling, rollover detection, automatic door locks, and active suspension.

“The UN Road Safety Collaboration has introduced a global plan for the decade 2011-2020. The plan focuses on road safety activities such as improving the safety of road infrastructure and broader transport networks; building road safety management capacity; enhancing the behavior of road users; further developing the safety of vehicles; and improving post-crash care,” says Sunil.

MEMS microphones are mainly used in the automotive segment for speech or voice recognition in automobile audio systems. This will enable the passengers to stay connected and be entertained in a safe environment, as they can communicate with the audio system verbally. This has the possibility to reduce road accidents, as people are often distracted by factors such as adjusting the car audio system or speaking on mobile phones.

Global MEMS market for industrial segment

The industrial segment was valued at USD 1.2 billion in 2015 and will reach USD 1.95 billion by 2020, growing at a CAGR of above 10% during the forecast period. MEMS are used in many industrial applications such as construction equipment, agricultural machinery or platform leveling, and for testing applications. MEMS accelerometers are used for vibration sensing conditions such as automotive testing or monitoring the pitch and roll of an aircraft.

MEMS are also used with IoT for industrial automation. MEMS technology is helpful for industrial robots, as it can be applied to tactile sensors, navigation, or proximity sensors. MEMS are used for condition monitoring of transportation and industrial equipment, vibration and rotational speed monitoring, asset and parcel tracking and monitoring, shock detection and logging, building and structure monitoring, and vibration and tilt monitoring.