Category Archives: Materials and Equipment

NanoCon Newswire

Aug. 24, 2006 (Emeryville, Calif.) — Nanomix Inc., a leading nanoelectronic detection company commercializing high-value diagnostic and monitoring applications, today announced the appointment of Dr. Michael D. Cable as Vice President, Platform Development to lead the company’s efforts in detection platform optimization for a variety of applications. In this position, Dr. Cable will report to David Macdonald, President and Chief Executive Officer.

Dr. Cable has over 20 years experience with a broad range of instrumentation and detection technologies related to medical diagnostic and monitoring applications. After earning a BS in Chemistry and Physics from Iowa State University, Dr. Cable obtained his Ph.D. from University of California Berkeley in Nuclear Chemistry and Physics. He has published extensively and holds multiple patents.

Prior to joining Nanomix, Dr. Cable was Vice President, Research and Development at Fovi Optics where he was involved with non-invasive glucose detection. He has been a consultant to Quantum Dot Corporation and held the position of Vice President and Chief Technology Officer at Xenogen. Dr. Cable has also held positions of increasing responsibility at the University of Rochester and Lawrence Livermore National Laboratory.

“We are thrilled with the addition of Mike to our management team,” said Nanomix CEO David Macdonald, “He will further enhance our detection platform and our ability to effectively execute project plans.”

About Nanomix

Nanomix is a leading nanoelectronic detection company launching a portfolio of devices based on Sensation™ technology. These scaleable devices use ultra-sensitive carbon nanotube detection elements combined with proprietary chemistries. They can be deployed across a broad range of industrial and medical applications where valuable attributes – low power consumption, small size, and high sensitivity offer significant performance advantages and enable unprecedented access to critical information. Nanomix is located in Emeryville, California. For additional information, please visit the Nanomix web site at www.nano.com

NanoCon Newswire

Aug. 22, 2006 – NanoInk, Inc., an emerging growth technology company specializing in nanometer-scale manufacturing and applications development in the life sciences and semiconductor industries, announced today that it has been awarded a $735,000 Phase II Small Business Innovation Research (SBIR) grant from the National Human Genome Research Institute (NHGRI) of the National Institutes of Health (NIH). The Grant will be used to develop novel, biologically functional nanostructures that dramatically enhance the reproducibility, sensitivity, and spatial density of chip-based assays.

“Creation of these nanostructures will improve life science applications ranging from point-of-care diagnosis to genomic and proteomic arrays used in basic research by enabling the development of next generation screening technologies that are faster, more sensitive, more reliable, and possibly more cost-effective than those presently available,” said Cedric Loiret-Bernal, M.D., Chief Executive Officer of NanoInk.

To accomplish this objective, NanoInk will develop a patterning methodology based on Dip Pen Nanolithography (DPN(R)) technology to generate sub-micron sized features on solid surfaces. The DPN method, built upon the technique of Atomic Force Microscopy (AFM), allows materials to be deposited uniformly in a direct-write fashion on surfaces with nanoscale spatial precision. This approach offers significant advantages over current microarray printing technologies that suffer from poor location-to-location reproducibility in terms of size, shape, and biomolecule density, as well as reproducibility across microarray slides.

NanoInk will also develop a nanoarray fabrication platform consisting of a DPN arrayer, parallel multipen arrays with integrated microfluidic inking systems and appropriate pen and surface modification chemistry to allow patterning with a variety of biomolecules.

The final product of this ongoing NIH-supported research is expected to result in significant near and long-term commercial applications for the biotechnology industry.

About NanoInk

NanoInk, Inc. is an emerging growth technology company specializing in nanometer-scale manufacturing and applications development for the life sciences and semiconductor industries. With DPN(R), a patented and proprietary nanofabrication technology that allows for unmatched flexibility and accuracy, and also its high-resolution Nanoencryption(TM) technology, NanoInk is able to offer its pharmaceutical customers innovative solutions to fight counterfeiting and illegal diversion of blockbuster pharmaceutical products. Other key applications include nanoscale additive repair, and nanoscale rapid prototyping. Located in the new Illinois Science + Technology Park, north of Chicago, NanoInk currently has over 100 issued or pending patents and patent applications filed worldwide and has licensing agreements with Northwestern University, Stanford University, and the University of Illinois at Urbana-Champaign. For more information on products and services offered by NanoInk, Inc., see www.nanoink.net.

For Media Inquiries:
David Gutierrez
Dresner Corporate Services
312-780-7204
[email protected]

For Investor Inquiries:
Kristine Walczak
Dresner Corporate Services
312-780-7205
[email protected]

SOURCE: NanoInk

NanoCon Newswire

July 31, 2006 (Hillsboro, Ore.) — FEI Company (Nasdaq: FEIC) today announced that scientists at its NanoPort(TM) in Europe have broken another image resolution barrier with the world’s most advanced commercially-available microscope, the Titan(TM) 80-300 corrected S/TEM. For the first time ever, directly interpretable TEM images with atomic resolution better than 1.4 Angstrom were obtained at the very low operating voltage of 80kV.

The result was welcomed by some of the world’s leading research centers as an important milestone in nanocharacterization as now even light element materials such as carbon nanotubes and graphene can be imaged artifact-free and with high contrast while having highest lateral resolution.

Direct atomic resolution at 80kV was obtained for various classes of materials: gold nanoparticles, silicon and single wall carbon nanotubes. The smallest atomic distance resolved was the well-known silicon dumbbell distance of 1.36 Angstrom. These new findings will be presented in a scientific presentation at the Microscopy & Microanalysis 2006 conference being held this week in Chicago.

“I am pleased to see this proof of the stability of the Titan column at the low-voltage end of its range. This is good news for the TEAM project, which specifically demands unprecedented resolution over the whole operating range of 80 to 300kV to meet a spectrum of scientific challenges. I consider this a significant milestone for the TEAM/FEI collaboration,” commented Ulrich Dahmen, TEAM Project Director from the National Center for Electron Microscopy in Berkeley, California.

“With their resolving power at an accelerating voltage of only 80 kV, the Titan instruments will allow us to get much deeper and more reliable insight in materials classes previously excluded from high-resolution analysis due to their beam-sensitivity. This will include nanomaterials composed of light elements in both hard and soft matter, which can now be investigated at an unprecedented contrast and spatial resolution,” said Joachim Mayer from the Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons at the Research Centre Juelich, Germany.

“We are proud to deliver to our customers our promise of the ultimate performance, stability and flexibility for a new era of groundbreaking results. We have shown the world record performance at 300kV before, now we can add the milestone at 80kV,” said Rob Fastenau, senior vice president for FEI’s NanoResearch & Industry and NanoBiology market divisions. He added: “I am very pleased that the Titan 80-300 shows direct atomic resolution over the entire range of operating voltages. It will give us the opportunity to further accelerate our mission to remain the world leader in high-resolution imaging and analysis and an important enabler for the world’s growing nanotechnology industry.”

The milestone results were achieved on a Titan 80-300 equipped with an aberration corrector. The Titan is designed as a dedicated and upgradeable aberration-corrected system for ultimate performance and ultimate flexibility. The corrector, developed by CEOS GmbH in close collaboration with FEI Company, allows for significant resolution improvement and removal of artifacts that normally hamper direct interpretation of images. The new resolution achievement underscores the ultimate flexibility and stability of the Titan 80-300 system.

About FEI Company

FEI’s Tools for Nanotech(TM), featuring focused ion- and electron-beam technologies, deliver 3D characterization, analysis and modification capabilities with resolution down to the sub-Angstrom level and provide innovative solutions for customers working in NanoBiology, NanoResearch and NanoElectronics. With R&D centers in North America and Europe, and sales and service operations in more than 50 countries around the world, FEI is bringing the nanoscale within the grasp of leading researchers and manufacturers and helping to turn some of the biggest ideas of this century into reality. More information can be found on the FEI website at: www.fei.com.

SOURCE FEI Company

07/31/2006

CONTACT: Dan Zenka, APR, Global Public Relations of FEI Company, +1-503-726-2695, or [email protected]

Web site: http://www.feicompany.com

(FEIC)

September 6, 2006 – Nova Measuring Instruments, Rehovoth, Israel, is soliciting bids from approximately 100 companies to license six of its patents relating to use of a lithography tool with integrated metrology, and will even accept bids for outright ownership of the technology.

The company says it will use an auction model to set a market price for the licenses, which it says covers only a small portion of its portfolio. Among the patents being auctioned: four relating to a lithography track with integrated optical measurement capability, used with overlay registration, critical dimensions, and macrodefect inspection; and two patents from its advanced process control group, related to methods for photolithographic processing involving making a spectrophotometric measurement and using it to influence the processing time, focus or exposure of a processing tool.

“We believe this auction will allow us to capitalize on favorable industry trends and unlock the true value of our intellectual property assets,” stated Gabi Seligsohn, president and CEO of Nova, adding that the auction will help avoid litigation of potential infringements in the future by establishing the value of the assets and monetizing them.

Nova is accepting bids for either a license for a particular model of semiconductor processing equipment (including customer rights to use), or a license to practice the patents at a fabrication facility. The company says it may select one or more offers, or none at all, with successful bidders notified by Feb. 15, 2007. A full list of the companies that have been invited to participate in the auction, including leading-edge IC manufacturers, semiconductor equipment manufacturers, and metrology companies, is available on the Hoffman & Zur Web site.

“By allowing the market rather than the courts to value patents, intellectual property worth many millions of dollars can be monetized in a more efficient, less contentious manner – clearly a benefit to the industry,” stated Eran Zur, partner at law firm Hoffman & Zur retained to handle the process.

September 6, 2006 – Nova Measuring Instruments, Rehovoth, Israel, is soliciting bids from approximately 100 companies to license six of its patents relating to use of a lithography tool with integrated metrology, and will even accept bids for outright ownership of the technology.

The company says it will use an auction model to set a market price for the licenses (including counterpart Israeli patents, pending US continuations, and European and Japanese applications), which it says covers only a small portion of its portfolio. Among the patents being auctioned: four relating to a lithography track with integrated optical measurement capability, used with overlay registration, critical dimensions, and macrodefect inspection; and two patents from its advanced process control group, related to methods for photolithographic processing involving making a spectrophotometric measurement and using it to influence the processing time, focus or exposure of a processing tool.

“We believe this auction will allow us to capitalize on favorable industry trends and unlock the true value of our intellectual property assets,” stated Gabi Seligsohn, president and CEO of Nova, adding that the auction will help avoid litigation of potential infringements in the future by establishing the value of the assets and monetizing them.

Nova is accepting bids for either a license for a particular model of semiconductor processing equipment (including customer rights to use), or a license to practice the patents at a fabrication facility. The company says it may select one or more offers, or none at all, with successful bidders notified by Feb. 15, 2007. A full list of the companies that have been invited to participate in the auction, including leading-edge IC manufacturers, semiconductor equipment manufacturers, and metrology companies, is available on the Hoffman & Zur Web site.

“By allowing the market rather than the courts to value patents, intellectual property worth many millions of dollars can be monetized in a more efficient, less contentious manner – clearly a benefit to the industry,” stated Eran Zur, partner at law firm Hoffman & Zur retained to handle the process.

Hybrid membrane technology represents first breakthrough offering from DuPont Separations Solutions

August 30, 2006 — WILMINGTON, Del. — DuPont today announced the introduction of its latest innovation, Hybrid Membrane Technology (HMT), a new offering for air and liquid filtration that is poised to fill the performance gap between traditional nonwovens and microporous films. Comprised of continuous sub-micron fibers and available on a commercial scale in the form of “membrane-like” sheet structures, DuPont HMT delivers an optimal balance of flux/barrier performance. HMT will be the leading technology provided in a portfolio of DuPont Nonwoven technologies that will be offered through DuPont Separations Solutions (DSS), a new growth initiative dedicated to developing and implementing technologies for filtration.

“DuPont Separations Solutions will look beyond today’s nonwovens and membrane filtration media to deliver enhanced performance across a variety of air and liquid applications. Through leveraging existing technologies and developing new technologies such as HMT, DuPont will help provide cleaner and healthier environments, improve manufacturing process efficiency, and deliver better performance across a wide range of market applications,” said Matt Trerotola, vice president and general manager – DuPont Nonwovens. “DuPont will also go beyond the traditional role of a media supplier by providing finished filters in targeted applications in order to best serve our market demands and customers’ needs.”

DuPont Separations Solutions’ air filtration product portfolio will include:

— DuPont™ BarriRFlux™ with Hybrid Membrane Technology for the healthcare and life sciences markets,

— DuPont™ Premium Air Filtration Products for reduced energy consumption and reliable contamination control in commercial HVAC applications,

— DuPont™ Premium Interior Air Filters for automotive applications, and

— Various composite structures aimed at a wide variety of applications in the transportation and industrial markets.

DuPont Separations Solutions’ liquid filtration product portfolio will include:

— DuPont™ BarriRFlux™ for critically clean applications in industries such as life sciences, food and beverage, and areas where contamination prevention and process utilization are a top priority.

— Traditional DuPont Nonwoven technologies, such as DuPont™ Xavan® (spunbond polypropylene), Sontara®, and Tyvek® for the construction of composite structures and support media for food grade required applications as well as large particle removal applications commonly found in many industrial applications where quality, reliability, and consistency are a given.

“Trends ranging from stricter regulatory requirements to rising energy costs are requiring organizations in industries such as automotive, food and beverage, HVAC and life sciences to seek new separation and filtration technologies that deliver increased levels of safety and efficiency. The launch of the DuPont Separations Solutions initiative and the introduction of HMT demonstrate our commitment to providing these and other industries with the technologies required to fill their diverse needs — both today and into the future,” added Trerotola.

DuPont is a science company. Founded in 1802, DuPont puts science to work by creating sustainable solutions essential to a better, safer, healthier life for people everywhere. Operating in more than 70 countries, DuPont offers a wide range of innovative products and services for markets including agriculture, nutrition, electronics, communications, safety and protection, home and construction, transportation and apparel.

The DuPont Oval, DuPont™ and The miracles of science™ and BarriRFlux™, Xavan®, Sontara®, and Tyvek® are registered trademarks or trademarks of DuPont or its affiliates.

CONTACT
Gil Chorbajian
Vice President
Ogilvy Public Relations Worldwide
(518) 355-0966
[email protected]

August 23, 2006 — /PRNewswire/ — ENGLEWOOD, Colo. — At a ceremony held today at its Englewood-based world headquarters, Baxa Corporation opened its state-of-the- art STAR (Skills Training, Academics and Resources) Center for pharmacy and cleanroom skills training. Baxa designed and built the STAR Center as a fully USP < 797 >-compliant pharmacy cleanroom to provide professional education on pharmacy practice, cleanroom principles and compliance to regulatory requirements. The STAR Center, the only dedicated facility of its kind in the world for hands-on cleanroom experience and training in environmental monitoring and aseptic technique, provides a unique opportunity for industry professionals to learn best practice from subject-matter expert trainers.

The first class in the STAR Center, Compliance Tools and Aseptic Certification for USP < 797 >, takes place the week of September 20th 2006. This ACPE-certified training targets pharmacy and IV managers, but provides relevant content for all personnel who compound sterile products. Over 2-1/2 days, the Continuing Education (CE) course covers practical implementation of cleanroom principles and practices that comply with USP 797 and hands-on experience in industry best practice. Topics for this initial program include cleanroom physical design and layout, engineering controls and airflow science, media fill testing and principles associated with work flow, staff training, cleaning, monitoring, validation and documentation.

Speaking at the ribbon-cutting ceremony, Baxa CEO Greg Baldwin noted, “As the only company focused on making hospital pharmacy operations more efficient, Baxa has built true partnerships with our customers. The STAR Center takes that partnership a step further by backing our products with world-class training in best practice.” Following the speech, Baxa associates at the company’s headquarters were invited to an open house at the STAR Center — to see first-hand how the facility has come together since the early planning last winter.

Baxa Corporation sponsored the STAR Center to further best practices in hospital pharmacy. The STAR Center brings together professional and industry partners to provide participants with a range of experience in equipment, technology and design. Pete Campanella PharmaD, Baxa Director of Professional Services affirms that, “The STAR Center provides pharmacies with an unparalleled opportunity to improve performance and regulatory compliance. However, the facility has application for many other related industries for training in best practices. We are working with pharmaceutical manufacturers, cleanroom certifiers and others to develop additional course content.” Future class offerings will be determined through professional interest and facility requirements.

About Baxa Corporation

Baxa, a customer-focused medical device company, provides innovative, solution-based technologies for fluid handling and delivery. Its systems and devices promote the safe and efficient preparation, handling, packaging, and administration of fluid medications. Privately held, Baxa Corporation has subsidiaries and sales offices in Canada and the United Kingdom; direct representation in Belgium, Denmark, Finland, France, Germany, Luxembourg and The Netherlands; and distribution partners worldwide. Further information is available at http://www.baxa.com.

About the STAR Center

The STAR Center is a state-of-the-art cleanroom, pharmacy and training facility located at the Baxa world headquarters in Englewood, Colorado. The center was purpose-built to support training in aseptic technique, pharmacy workflow and practice, cleanroom design and maintenance and USP < 797 > compliance among other topics. Classes will be taught by industry-recognized subject matter experts. Further information is available at http://www.baxa.com/starcenter

Contact:

Marian Robinson, Vice President, Marketing
Baxa Corporation
800.567.2292 ext. 2157 or 303.617.2157
Email: [email protected]

Maggie Chamberlin Holben, APR
Absolutely Public Relations
303.984.9801 or 303.669.3558
Email: [email protected]

Source: Baxa Corporation

Everyone knows carbon nanotubes have tremendous potential, but who expected that they might work as flashlights? Answer: IBM researcher Jia Chen. Last year, she published a paper in Science describing a new way to make carbon nanotubes into light sources a thousand times brighter than light-emitting diodes. With this discovery she brings closer a time when all information may be efficiently transmitted using speed-of-light photons rather than relatively pokey electrons.


IBM researcher Jia Chen developed a new way to convert electricity into light using nanotubes. Photo courtesy of IBM
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Her research group injected electrons into carbon nanotubes and “tricked” them into picking up positive charges at a faster rate than usual through clever design of the substrate holding the nanotubes. Every time an electron bonds with a positive charge, or “hole,” it produces a photon. The particular technique results in every injected electron producing a photon – a much more efficient rate than usual.

In an article that appeared in Small Times Chen reports, “We were able to coerce the electrons to convert the energy to light instead of dissipating into heat.” And the best part: the photon-emitting nanotubes can be produced using the same fabrication processes as silicon semiconductor devices and potentially can be built into light-based circuitry in the same footprint as conventional electronic components.

The nanotube light isn’t Chen’s first venture into world-changing research. As a graduate student at Yale, working with Mark Reed (longtime collaborator of Innovator of the Year, Jim Tour), she created the first reversible molecular switch. The achievement was chosen for Science’s 2001 “breakthrough of the year” section.

Among numerous accolades, she has also been recognized by the National Academy of Engineering as one of the nation’s top 80 brightest young engineers. She holds U.S. and foreign patents on molecular devices, memory storage devices, CMOS processes and devices, and carbon nanotube electronic and optoelectronic devices.


Russell Cowburn

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Russell Cowburn, chair in Nanotechnology, Imperial College London, invented a laser scanning technique that reads the unique nanoscale irregularities in the surface of paper and uses them to track a “fingerprint” to thwart counterfeiters. The fingerprint survives even if the paper is soaked in water, scorched or scrubbed with abrasive pads.
Photo courtesy of Imperial College London

James Tour

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James Tour, Innovator of the Year winner, Chao Professor of Chemistry, and director of the Smalley Institute for Nanoscale Science and Technology at Rice University, is bringing molecular self-assembly to the point of commercial reality. His nanocar is a practical example of molecular manipulation, and his group is working on more sophisticated machines.
Photo courtesy of Rice University

Huikai Xie

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Huikai Xie, assistant professor of electrical and computer engineering, University of Florida, designed a tiny motion sensor that can be manufactured with standard CMOS technology that uses one-thousandth of a watt of power. It has myriad potential applications, including in clothes to track the motions of athletes or to monitor the elderly in their homes.
Photo courtesy of University of Florida

Jie Zhang

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Jie Zhang, principal staff engineer, Motorola, demonstrated the first all-printed timing circuit produced using a graphic arts printing press and nanoscale-particulate-based inks. That was in 2003 and, since then, she has used those techniques to fabricate 50 miles of integrated circuits as well as drive the research to the stage where it’s ready to be produced and commercialized.
Photo courtesy of Motorola

By Angela Godwin

DuPont Personal Protection recently introduced its new line of apparel for controlled environments. Developed for professionals in the life science, pharmaceutical, biotechnology, electronics, food processing and medical device manufacturing industries, the Suprel® LS apparel is based on DuPont’s proprietary Advanced Composite Technology. According to the company, the patented bi-component fabric offers breathability and barrier protection, with a more comfortable feel than other materials.

“The Suprel LS line continues our efforts to listen to the voice of the controlled environment customer,” says Jessica Lai Perez, new business development manager for DuPont Nonwovens. “We have been repeatedly asked by customers to offer a product line that’s comfortable and delivers a level of protection that complements our premium Tyvek® IsoClean™ garments. Suprel LS fills that need by offering a unique combination of breathability and barrier protection with a softer feel and increased comfort, as compared to limited-use microporous film (MF), spun-bonded polypropylene (SBPP), SMS, SMMS, and low-barrier reusable garments currently available in the market.”


Developed for professionals in the life science, pharmaceutical, biotechnology, electronics, food processing and medical device manufacturing industries, the Suprel LS apparel is based on DuPont’s proprietary Advanced Composite Technology. Photo courtesy of DuPont Personal Protection.
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Perez says the fabric, which is available exclusively through DuPont, “provides ease of movement and less surface friction, which equates to ‘uncompromised comfort’ for the wearer.”

According to Dale Outhous, global business director for DuPont Personal Protection, “Suprel LS continues DuPont’s commitment to those working in controlled environments by delivering the comfort and protection required when garments are worn for an extended period of time, while maintaining a competitive price point.”

The new line was designed as a cost-effective alternative to the company’s premium Tyvek IsoClean apparel line. “By offering a cost-effective alternative…Suprel LS provides a strong addition to our line of contamination control garments,” says Outhous.

Perez says the fabric exhibits normal textile flammability per CPSC 16 CFR 1610. It is not fire-retardant, and therefore not intended for use around heat, flame, sparks or in potentially flammable or explosive environments. Suprel LS is treated for static dissipation, and has a static decay time less than 0.5 seconds per IST 40.2.

Silicone contamination, which has been traced to the thread used in cleanroom garments, is a growing concern for contamination-control professionals. The Suprel LS garments, according to Perez, “have been tested using infrared analysis of a hexane extract and no silicone was detected.”

DuPont worked closely with both customers and industry experts to develop the product. Beginning in early 2005, the development and refining process spanned a period of eighteen months. In the first half of 2006, Suprel LS was introduced into selected cleanroom markets and shown at several trade shows. “We introduced our most popular styles of coveralls and frocks for initial evaluation, and the overall response has been overwhelmingly positive,” says Perez.

Several styles of Suprel LS garments are now available, including a selection of coveralls and frocks, but an expanded portfolio of product styles is expected to launch later this month. “We believe in continually improving our product performance as well as cost position to remain competitive in this marketplace,” says Perez, “and [we’re] prepared to add more styles of Suprel LS garments as demand dictates.”

Suprel LS is available gamma sterilized to an SAL of 10-6, as well as bulk packaged. Select styles will be available in blue or standard white color.

By Peter Cartwright, P.E., Cartwright Consulting Co.

As both the quality and quantity requirements for contaminant-free water increase, the demands for innovative technologies and improved system designs are creating challenges and opportunities for the multitude of industries that require ultrapure water.

All water supplies contain contaminants. The kind of contaminant is hugely variable and no two water sources are identical with regard to the kind and concentration. What constitutes a contaminant is entirely dependant on the application; for drinking water, it is defined by the Safe Drinking Water Act, a regulatory document. For semiconductor rinsing, anything other than H2O is a contaminant and the concentrations must be as close to zero as possible.

As it is virtually impossible to make water free of any and all contaminants, the goal of a treatment process is to reduce the level as much as possible.

It is possible to classify contaminants by category to more easily address their removal (see Table 1). There is no shortage of water treatment technologies available. Some remove only a single class of contaminants, while others are more versatile. Each technology has strengths and weaknesses. No single technology will produce truly ‘ultrapure’ water.

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As a result, the challenge is to design a system utilizing a combination of technologies to provide optimum contaminant removal to meet the particular ‘use-specific’ water quality requirements.

The pressure membrane technologies of microfiltration, ultrafiltration, nanofiltration and reverse osmosis are the most versatile and, hence, most widely used as the lynchpin of most ultrapure water production systems.

In particular, membrane technologies possess certain properties that make them unique when compared to other water treatment technologies. These include:

Continuous process, resulting in automatic and uninterrupted operation

Low energy utilization involving neither phase nor temperature changes

Modular design-no significant size limitations

Minimal moving parts with low maintenance requirements

No effect on form or chemistry of contaminants

Discreet membrane barrier to ensure physical separation of contaminants

No chemical addition requirements

Simply put, these technologies are continuous filters. The form of contaminant removed is a function of membrane polymer selection and its pore size. Although they all provide separation of contaminants from water, each performs a specific function and has specific advantages and disadvantages when compared to the others in a particular application.

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The development in filtration technology known as ‘crossflow’ or ‘tangential flow’ filtration allows for continuous processing of liquid streams. In this process, the bulk solution flows over and parallel to the filter surface and, because this system is pressurized, water is forced through the filter medium and becomes ‘permeate.’ Turbulent flow of the bulk solution across the surface minimizes the accumulation of particulate matter on the filter surface and facilitates continuous operation of the system. Figure 1 compares the crossflow mechanism with conventional filtration.

Microfiltration

Generally, microfiltration (MF) involves the removal of particulate or suspended materials ranging in size from approximately 0.01 to 1 micron (100 to 10,000 angstroms). Figure 2 depicts the mechanism of microfiltration (MF).

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Ultrafiltration

Ultrafiltration (UF) is used to separate materials typically smaller than 0.01 micron (100 angstroms). The removal characteristics of UF membranes can be described in terms of molecular weight cutoff (MWCO), the maximum molecular weight of compounds that will pass through the membrane pores. MWCO terminology is expressed in daltons. Basically, ultrafiltration is used to remove dissolved nonionic contaminants, while suspended solids are removed by microfiltration (see Fig. 3).

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Nanofiltration

Nanofiltration (NF) is an intermediate process between ultrafiltration and reverse osmosis. The MWCO properties of nanofiltration membranes are in the range of 300 to 800 daltons (<10 angstroms). Ionic rejections vary widely depending upon the valence of salts; multivalent salts such as magnesium sulfate (MgSO4) are rejected as much as 99 percent, while monovalent salts such as sodium chloride (NaCl) may have rejections as low as 10 percent (see Fig. 4).

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Reverse osmosis

The reverse osmosis (RO) process removes all dissolved organic (nonionic) solids with molecular weights above approximately 100 daltons, as well as a high percentage of ionic materials. Because reverse osmosis membranes are not perfect (they will typically remove 95 to 99 percent of the ionic contaminants), they are generally used as pretreatment to a final ‘polishing’ deionization unit for high-purity water production (see Fig.5).

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Membrane elements

To be effective, membrane polymers must be packaged into a configuration commonly called a ‘device’ or ‘element.’ The most common element configurations are: tubular, capillary fiber, spiral wound, and plate and frame (see Fig. 6)

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Tubular

Manufactured from ceramic, carbon, stainless steel or a number of thermoplastics, these tubes have inside diameters ranging from 3/8 inch up to approximately 1 inch (10 to 25 mm). The membrane is typically coated on the inside of the tube and the feed solution flows through the interior (lumen) from one end to the other, with the permeate passing through the wall to be collected on the outside of the tube.

Capillary (hollow fiber)

These elements are similar to tubular elements in design, but are smaller in diameter, are usually unsupported membrane polymers and require rigid support on each end provided by an epoxy ‘potting’ of a bundle of the fibers inside a cylinder. Feed flow is either down the interior of the fiber or around the outside of the fiber.

Spiral wound

This element is constructed from an envelope of sheet membrane wound around a permeate tube that is perforated to allow collection of permeate. Water is purified by passing through one layer of the membrane and flowing spirally into the permeate tube. It is by far the most common configuration in water purification applications.

Plate and frame

This element incorporates sheet membrane stretched over a frame to separate the layers and facilitate collection of the permeate, which is directed into a center tube.

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From the perspective of cost and convenience, it is beneficial to pack as much membrane area into as small a volume as possible. This is known as ‘packing density.’ The greater the packing density, the greater the membrane area enclosed in a certain-sized device and, generally, the lower the cost of the membrane element. The downside of the high-packing-density membrane elements is the increased propensity for fouling (see Table 2).

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Figure 7 illustrates a complete membrane processing system. In terms of function, it could also represent a single membrane element. Note that the ‘feed’ stream enters the system (or membrane element) and as the stream passes along and parallel to the surface of the membrane under pressure, a percentage of the water is forced through the membrane polymer producing the permeate stream. Contaminants are prevented from passing through the membrane based on the polymer characteristics. This contaminant-laden stream exits the membrane system (or element) as the ‘concentrate’ stream, also known as the ‘brine’ or ‘reject.’

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The percentage of feed flow that passes through the membrane and becomes permeate is known as ‘recovery.’ Typically, for water purification applications, recovery is set below 85 percent. As recovery is increased (to decrease the concentrate volume), the concentration of contaminants in the concentrate stream increases significantly. This effect is mathematically developed and illustrated in Table 3.

Fouling

The vast majority of membrane element device and system failures are caused by membrane fouling, which is usually the result of one or more of the following mechanisms:

Suspended solids in the feed stream due to improper feed water filtration

Precipitation of insoluble salts or oxides resulting from concentration effects within the membrane device

Biofilm caused by microbiological activity

These mechanisms cause the membrane surface to become coated with fouling materials that build up in layers. As the layer thickness increases, the flow rate across the membrane surface and immediately adjacent to it decreases, reducing local turbulence and encouraging more settling of suspended solids, which increases the fouling layer thickness-a vicious cycle.

With nanofiltration and reverse osmosis membranes, which reject ionic contaminants, fouling usually creates a phenomenon known as ‘concentration polarization.’ The fouling layers inhibit the free movement of the feed stream away from the membrane surface and, as salts are rejected from the membrane, their concentration at the surface is higher than in the bulk solution (that portion above the fouling layer).

Since ionic rejection is always a percentage of the salt concentration at the surface of the membrane, the permeate quality decreases as a direct result of concentration polarization and this phenomenon may actually indicate the presence of foulants before a reduction in permeate flow is detected. The increased salt concentration at the membrane surface also promotes precipitation of those salts whose solubility limit is exceeded as a result of concentration polarization.

For ultrapure water production, reverse osmosis is virtually always used and, as this membrane technology is the most susceptible to fouling, pretreatment is usually necessary.

Additionally, reverse osmosis by itself will not produce ultrapure water (by most definitions). As a result, most systems utilize additional technologies to polish the reverse osmosis permeate. This approach of breaking the system design down into components has resulted in the concept of looking at every system as the optimum combination of pretreatment, primary and post treatment technologies.

Pretreatment

Pretreatment technologies are dictated by the raw water quality and limitations imposed by the reverse osmosis membrane polymer. If the raw water is prone to calcium carbonate scaling (positive Langelier Index), pretreatment should include one or more of the following: softening, acidification or dispersant addition. Excessive iron (above 0.3 ppm) can be removed with a manganese greensand filter or oxidation and filtration. If the turbidity is above 0.1 NTU, a backwashable multi-media filter should be used. Cellulosic reverse osmosis membrane polymers are sensitive to hydrolysis at a pH above 7.0; this requires that acidification be used with high pH water supplies.

Activated carbon is a pretreatment technology capable of removing residual chlorine, which is essential when thin film composite reverse osmosis membrane polymers are utilized. In those applications where cellulosic polymers are used, the activated carbon unit is normally placed downstream of the reverse osmosis unit. Activated carbon filters must be backwashed to remove accumulated particulate material and require periodic replacement of the filter media.

Primary treatment

As stated above, reverse osmosis is usually the key technology utilized for ultrapure water production. To achieve the required ultrapure quality for the specific application, one or more of the following technologies are used.

Mixed bed deionization

Mixed bed deionization (DI) will ‘polish’ the purified water up to 18 megohm-cm resistance, the maximum ionic purity attainable in industrial systems. Because deionization is a batch process, consideration must be made for off-line regeneration.

Obviously, if the system is used continuously, another identical DI unit must be available to allow time for regeneration of the exhausted resin without total system shutdown.

Resin beds that sit idle for more than 48 hours at a time may contribute to microorganism problems in the water treatment system.

Electrodeionization

The newest development in high-purity water production is a technology known both as electrodeionization (EDI) and continuous deionization (CDI) (see Fig. 8). This process is basically a combination of electrodialysis (ED) and resin deionization (DI). The DI resins are enclosed between layers of ED membranes. The energy to effect separation is electrical, imparted to positive and negative electrodes. The DI resins do not adsorb ionic contaminants, but facilitate ion movement into the concentrate streams.

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When fed RO permeate, EDI will produce 18 megohm-cm quality water. It is a continuous process and does not require regeneration.

Storage

In general, once the water has been treated to achieve the desired purity, it is directed to a storage tank, which is typically constructed of inert materials and is sized to hold anywhere from several hour’s to a full day’s requirement. It is typically either vented to the atmosphere with the tank protected from atmospheric contamination by a submicron vent filter, or it is sealed with a blanket of inert gas such as nitrogen. The storage tank receives water directly from the primary treatment system as well as water from the recirculation loop.

Post treatment

Because ultrapure water is extremely aggressive and will become contaminated by virtually anything with which it comes into contact, the distribution loop from the storage tank to the points of use generally requires technologies to continuously remove these contaminants. The technologies defined earlier are often utilized as part of this post treatment. As the recirculation rate in this loop is usually much higher (and more variable) than the production rate to the storage tank, the technology components must be sized accordingly.

Microfiltration

Typically 0.1- or 0.2-micron filters are used to remove particulate materials and live bacteria. These can be either conventional ‘dead-end’ cartridges or crossflow membrane devices. It is essential that they be manufactured from materials that will not leach or slough off into the pure water stream.

Ultrafiltration

Ultrafiltration often provides the final polish. With typical molecular weight cut-offs in the range of 5,000 to 100,000 daltons, UF is effective in removing most of the residual contamination in the system. Typically, ultrafiltration units are designed with recoveries of 95 to 98 percent, meaning that between 2 and 5 percent of the water flow is directed to the drain or recycled to the front of the system. Again, it is essential that all materials of construction in contact with the highly aggressive pure water be completely inert.

Ultraviolet irradiation

This unit is intended to reduce bacterial propagation throughout the storage tank and distribution piping. Although ultraviolet irradiation (UV) does not remove microorganisms-and there is some debate with regard to its ability to completely kill bacteria-it does inhibit bacterial growth and is an effective component of any high-purity water system.

Ozonation

Considered the most effective disinfectant available, ozone will also break down organic compounds, theoretically into their basic elements. It is so aggressive that special materials of construction must be utilized and it must be removed (usually with 254 nm UV) before the water can contact membranes or resins.

Today, the industries that are the largest consumers of pure water include: semiconductor manufacturing-for rinsing of electronic devices (computer chips, etc.); the power industry-for high-pressure-steam-generating boilers; the pharmaceutical industry-for manufacturing operations requiring USP or WFI water; hemodialysis-for preparation of dialysate solutions and rinsing artificial kidneys; and medical laboratories-for analytical and research activities.

Although each industry requires pure water that is ‘contaminant-free,’ the particular contaminants of concern and their acceptable residual levels vary according to the application.

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As analytical techniques become increasingly more sensitive, it has become obvious that there is no such thing as water that is completely free from all contaminants. Also, as water is purified it becomes more and more aggressive and will start to dissolve most materials with which it comes into contact.

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Recognizing the practicality of this situation, each industry has established pure-water quality requirements that constitute a compromise between performance and economic reality. Tables 4 and 5 provide examples of water quality standards or guidelines for the semiconductor manufacturing and pharmaceutical industries.

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Figure 9 illustrates a generic design for a typical pure-water treatment system. Although the optimum configuration is a function of the factors previously discussed, this system is representative for most applications.

Conclusion

In ultrapure water production, the optimum design requires the following input:

Feed water quality

Ultrapure water quality requirements

Ultrapure water quantity requirements

Of critical importance are the knowledge, experience and capability to select and implement the appropriate technologies into a complete, comprehensive, reliable and economical system.

Peter S. Cartwright, P.E., specializes in both marketing and technical consulting in high-technology separation processes. He can be reached via e-mail at [email protected].