Inventor's Corner
07/01/2003
Wet process decontamination
The method for wet-processing of a semiconductor-containing substrate reduces contamination by removing undesired gas contamination.
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The method uses liquid and vacuum pumps (A) to funnel a processing liquid through a degasifier (B), exposing the semiconductor wafers (C), in a tank (D), to the degasified processing liquid (E); and optionally, recirculating the processing liquid through the degasifier and back into the tank.
Patent number: 6,521,049 B1
Date granted: Feb. 18, 2003
Inventor: J. Brett Rolfson, of Micron Technology Inc. (Boise, Idaho)
Modular vacuum
This vacuum cleaner can be donned by cleanroom personnel, and features detachable filter and motor units.
Each of the four chamber connections (A) contains a different filter: HEPA (B), cyclonic (C), wet/dry (D) and paper (E).
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The filters connect to a backpack (F) worn by the operator. The top of the filter chambers have intake ports (G), a hose connection cap (H) and a hose (I); while the bottom contains the detachable motor unit (J), which has an on/off switch (K), an exhaust port (L) and power cord (M).
Patent number: 6,553,610 B1
Date granted: April 29, 2003
Inventor: Larry R. Shideler, of Proteam Inc. (Boise, Idaho)
Suit dryer
The apparatus for drying cleanroom and hazardous material suits uses a blower (A) and heating elements (B) mounted through a neck, wrist or ankle seal (C).
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The heated and compressed air is channeled through the suit via an air distribution system (D) to absorb moisture from internal surfaces, then is discharged through the seals, rapidly drying the suit.
The invention also includes inserts (E) for establishing a desired discharge rate from the suit seals. The inserts also serve to stretch the neck and arm seals to the proper diameter for maintaining comfortable wear.
Patent number: 6,516,536
Date granted: Feb. 11, 2003
Inventor: Michael V. Ryden, of Montrose, Colo.