Pall, Mykrolis go to the mat
05/01/2003
Patents on separation device used in point-of-use chemical dispense in question
By MARK.A. DESORBO
BILLERICA, Mass.—Pall Corp. is now on the receiving end of patent infringement allegations.
In early March, the East Hills, N.Y. purification technology developer was slapped with a lawsuit by Mykrolis Corp., a maker of liquid and gas delivery systems, charging that a fluid separation device manufactured by Pall infringes on two patents owned by Mykrolis.
Mykrolis maintains that Pall is unlawfully using its patented photoresist chemical filter pump technology, and has asked the U.S. District Court of Massachusetts for a preliminary injunction "to stop Pall from manufacturing, selling or offering to sell" its PhotoKleen EZD-2 assembly.
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Specifically, Mykrolis charges that the fluid separation device manufactured by Pall infringes two patents owned by Mykrolis. The patents cover the technology used in semiconductor manufacturing for point-of-use photochemical dispense, and filtration of photoresists and solvents.
Photographs of Pall's PhotoKleen EZD-2 and Mykrolis Impact 2 Manifold with filter bear striking resemblances, and Pall indicates that its product is an improvement on a device that has been on the market since 2001 "with no prior notice of concern from Mykrolis."
Mykrolis would not comment on how long its Impact 2 Manifold had been on the market. The patents it says were infringed upon, however, were granted within a two-year timeframe.
"We absolutely see no merit in their allegations of infringement or in the validity of their patent," says Pat Iannucci, Pall's vice president of communication."
Officials at Mykrolis refused to discuss aspects of the lawsuit, but did point out the technology is the basis for its Impact, Optimizer ST, and Panelgard 1-2-3 filters and manifolds, as well as its IntelliGen and RGEN dispense pumps.
"The technology consists of filters to filter chemicals and manifolds, which hold filters in place with our patented quick-disconnect method," says Scott Merrow, global product support manager for Mykrolis. "It can be mounted within the tool or externally, and the design allows filters to be changed quickly, minimizing potential exposure to hazardous chemicals."
Pall's PhotoKleen EZD-2 technology uses a hydrophilic Nylon 6,6 media, which the manufacturer says reduces start-up time by allowing the media to completely and spontaneously absorb, and minimizes photoresist waste during filter purge.
The filters, according to Pall, were designed to specifically address the needs of 193-nanometer platforms, with filtration down to 0.02 microns.
According to a Pall statement, "We fully expect our position to be validated in court."