New Products
03/01/2013
E-beam inspection system
KLA-Tencor Corp. announced the eS805, a new electron-beam inspection system capable of detecting very small defects, and defects that cause electrical problems such as opens, shorts or reliability issues. The eS805 is also designed to provide supplementary information to the fab's optical inspection systems, with the goal of boosting the ability of the optical inspectors to preferentially capture defects that matter. KLA-Tencor, Milpitas, CA, www.kla-tencor.com.
1/f noise measurement system
ProPlus Design Solutions, Inc., announced it is shipping a new wafer-level, 1/f noise measurement system designed to measure low-frequency noise characteristics of on-wafer or packaged semiconductor devices, including MOSFETs, bipolar junction transistors (BJTs), junction field effect transistors (JFETs), diodes and diffusion resistors. In addition to frequency domain measurement, 9812D can measure device noise in the time domain and can be used to perform on-wafer auto measurement for flicker (1/f) noise and Radom Telegraph Signal (RTS) analyses. ProPlus Design Solutions, Inc., San Jose, CA, www.proplussolutions.com.
Deep UV excimer laser mirrors
Newport Corp. introduced long-lived deep ultraviolet (UV) excimer laser mirrors with projected lifetimes greater than 30 billion pulses when used in the proper photocontamination controlled environment. The advanced new mirrors feature all dielectric high reflector coatings to minimize absorption and maximize reflected energy at 193nm.
The high energy laser mirrors are designed with excimer-grade UV-fused silica substrates which are polished to better than ??/10 flatness to preserve wavefront quality and maintain excellent stability. All coating and testing are done in a special photocontamination controlled deep UV cleanroom that has been qualified to 193nm standards. The company says that the new laser mirrors offer exceptionally high laser damage resistance. Special Pet-G and metal foil packaging ensure that parts are delivered clean and protected from any environmental photocontamination. Newport Corp., Irvine, CA, www.newport.com.
Virtuoso Advanced Node EDA
Virtuoso Advanced Node is a new set of custom/analog capabilities designed for the advanced technology nodes of 20nm and below. Built on the Cadence Virtuoso custom/analog technology, Virtuoso Advanced Node features capabilities that prevent errors before they are created rather than detect them late in the design process. Working in concert with Cadence Encounter RTL-to-GDSII flow, QRC Extraction and Physical Verification System, Virtuoso Advanced Node enables the development of mixed-signal chips that power today's consumer electronics devices.
The new and advanced Virtuoso technologies address layout-dependent effects (LDEs), double patterning, color-aware layout and new routing layers. They integrate with the Cadence Integrated Physical Verification System (IPVS) to conduct on-the-fly checks that reduce layout iterations. Cadence Design Systems, Inc. , San Jose, CA, www.cadence.com.
Solid State Technology | Volume 56 | Issue 2 | February | 2013