Product News
04/01/2008
Photolithography stepper stores up to 60 reticles
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System improvements to the model 9200 PanelPrinter system include handling as many as 60 reticles on its automated reticle library subsystem, with automatic loading of up to 6 masks/layer. Designed for Generation 4.5 applications, the model 9200 PanelPrinter provides throughput that is reportedly up to 80% higher than competing technologies, while maintaining optimum CD control. The system features a resolution of 1.5??m with a high-performance lens, providing a large 200mm lens field and a depth of focus of more than 9??m. Real-time auto-focus is utilized at every exposure site. The model 9200 features real-time magnification adjustment via the patented six-degree of freedom reticle chuck, which enables the highest possible accuracy in layer-to-layer registration and image field stitching. The high performance lens now provides up to ??30ppm real-time magnification adjustment. Azores Corp., Wilmington, MA USA; www.azorescorp.com.
Dry-break quick disconnects
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This dry-break quick disconnect connects without any fluid spray or leakage and disconnects with minimal dead volume. The assembly is constructed of stainless steel throughout and weighs only 15 grams. Both internal and external ends are available with 10-32 internal or external threads and include captured o-ring seals for leak-tight connections. Panel mount versions are also available. They are designed and manufactured for applications where space, leak-tightness, durability, and light weight are required. Beswick Engineering Co. Inc., Greenland, NH USA; www.beswick.com.
Computational litho platform and advanced DPT solution
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The Tachyon 2.5 computational lithography platform and the Tachyon DPT, an advanced double patterning technology (DPT) solution, have been introduced. The DPT allows chipmakers to meet the low k1 requirements for memory and logic devices at 32nm and below using advanced lithography systems. Tachyon 2.5’s combination of enhanced system and firmware advancements, together with faster processors, continues to meet the industry’s need for greater computational power, supporting the rapid adoption of DPT and other low k1 resolution enhancement technologies. Tachyon 2.5 reportedly provides up to 150% (2.5?? faster) greater performance than previous Tachyon systems with minimal increase in IT infrastructure costs. Tachyon DPT uses Brion’s latest double patterning technology to allow advanced chipmakers to develop devices down to the 22nm technology node. This production-ready, complete end-to-end solution supports both litho- (litho-etch-litho-etch) and spacer-DPT. Tachyon DPT offers full-chip, conflict-free pattern split, model-based OPC, model-based stitching compensation, and automatic density balancing. Brion Technologies, an ASML company, Santa Clara, CA USA; www.brion.com.
30/30 air filter
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The MERV 8 (ASHRAE 52.2-2007) “30/30” air filter is a high-efficiency pleated panel with reportedly low initial resistance, low maintained resistance to airflow, and a low average pressure drop. The MERV 8 30/30 has a distinctive design that provides full use of the media for maximum dust holding capacity. The media for the 30/30 filter is all-mechanical, rather than electrostatic, and maintains consistent, high removal efficiency throughout the filter’s life. The 30/30 is not subject to diminishment of collection efficiency that results from charge decay. The MERV 8 30/30 is guaranteed to 2.0 in. w.g. without media pack failure. The filter is rated by Underwriters Laboratories as a Class 2 or 1 filter, and is available in 2-in. and 4-in. configurations. The 30/30 may be used to meet requirements of the US Green Building Council (“LEED”) in terms of efficiency, energy savings, and reduced disposal impact. Camfil Farr, Stockholm, Sweden; www.camfilfarr.com.
3D simulation tool
The CoventorWare ARCHITECT module with Scene3D visualization realistically models the behavior of the disparate technologies incorporated in their designs. ARCHITECT is reportedly the only simulation tool available for quickly and accurately evaluating the behavior of MEMS, both as stand-alone components and in a surrounding system. Scene3D enables 3D views of an ARCHITECT schematic and fully contoured 3D results animations, allowing users to easily gain insight into the dynamic behavior of their designs. ARCHITECT is part of the CoventorWare suite of software tools for MEMS and micro-fluidic design, modeling, and simulation. Coventor Inc., Cary, NC USA; www.coventor.com.