Product Focus: Equipment Subsystems
01/01/2008
Noncorrosive BEOL post-etch residue remover
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The ACL-585 HiPER-Solv noncorrosive, environmentally benign post-etch residue remover is a high-performance solvent that provides reduced cost of ownership and prevents corrosion when compared with conventional hydroxylamine or solvent-amine products. ACL-585 is specifically formulated for advanced sub-90nm design rules that incorporate high density plasma etch. HiPER-Solv dissolves hard-to-remove inorganic or organometallic polymers from post-metal and post-via etch layers. ACL-585 works at a lower temperature (35-65°C) compared with traditional HA and solvent-amine formulations that require process temperatures from 65-80°C. It is designed for single-wafer, batch immersion, and batch spray tool applications. Applied Chemical Laboratories Inc., Sunnyvale, CA USA; ph 408/970-8880, www.appchem.com.
All-wetted PTFE flow-control needle valve
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The NVM series of all-wetted, manually operated, PTFE flow-control needle valves offers precise manual linear-flow control for aggressive and high-purity chemicals. The needle plug has a PTFE diaphragm seal. Constructed from high-purity PTFE, the NVM series valve is good for HP chemical processing and CMP applications. Its design features a diaphragm that isolates moving parts, no wetted threads, and no particle generation. The NVM is available in 0.25 in. to 0.5 in. sizes with flare and other common tube connections. As a difference from its earlier version, the needle valve has been redesigned and features molded parts. Plus, the bonnet, inner stem, and base are molded from durable PPS, while the handle is molded from PP. Asahi/America Inc., Malden, MA USA; ph 800/343-3618 or ph 781/321-5409, www.asahi-america.com.
Turbomolecular vacuum pump
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The iXA series of magnetic-bearing turbomolecular vacuum pumps exhaust process gases from physical vapor deposition, etching, chemical vapor deposition, or ion implant equipment in semiconductor, flat panel display, solar energy and industrial glass coating applications. The iXA family of pumps feature power supply and control modules that can be mounted in various configurations directly on the pump, or remotely, eliminating cables and accessory racks while still preserving the flexibility to fit a wide range of equipment. The first pump in the iXA family is rated at 2200 liters/sec-larger sizes are planned for future development. The pump’s five-axis magnetic bearing system and new motor and drive system have maintenance intervals as long as five years. Water and dust proof (IP54), and temperature management configurations are available. All pumps include RS232/485 (Profibus) serial communication interfaces. Edwards, Wilmington, MA USA; ph 800/848-9800 or 978/658-5410, www.edwardsvacuum.com.
450mm wafer handling vacuum wand
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The Freedom Wand wafer handling vacuum wand is battery-powered, portable, Class 1 (ISO-3) cleanroom compatible, and has ample vacuum pressure to assure safe handling of 450mm wafers. It is good for virtual fabs and pilot lines. The vacuum tip is designed to maximize holding while minimizing contact to the back of the wafer. The wand, which comes in tabletop and clip-on models, is priced from US$5000. H-Square Corp., Santa Clara, CA USA; ph 408/732-1240, www.h-square.com.
Solar cell surface cleaner
The BakerClean PV-160 solar cell surface cleaner is a wet chemical cleaning solution incorporated in the Energy Research Centre of the Netherlands’ (ECN) ECN-CLEAN process for manufacturing multicrystalline silicon solar cells. Solar cells produced utilizing this cleaner in the ECN-CLEAN process reportedly convert more incident light energy into electrical energy, generating more electricity than cells made without them. Solar panels made from these more efficient, higher-output solar cells generate more electricity per square meter than traditional solar arrays. Solar cells manufactured with the cleaner in this process exhibit relative energy conversion efficiency gains of 2%, providing more electricity output per unit of incident solar radiation. Mallinckrodt Baker Inc., Phillipsburg, NJ USA; ph 800/582-2537 or 908/859-2151, www.mallbaker.com.
Static conductive vacuums
A new line of static conductive vacuums is designed to eliminate nuisance static shocks commonly associated with vacuuming operations. This pneumatic vacuum eliminates static electricity by incorporating static conductive components to suppress charges. Models are available in 15, 30, and 55 gallon capacities. Because these vacuums are powered by compressed air, there are no moving parts to wear out. Nortech, a division of Guardair Corp., Chicopee, MA USA; ph 800/482-7324, www.nortechcorp.com.
Quadrupole mass spectrometer
The HiQuad quadrupole mass spectrometer with next generation Quadera software is reportedly 4 times faster than previous models, providing high measurement speeds up to 8000 data points/sec and sensitivity with a dynamic range of 10 orders of magnitude. The new, easy-to-use Quadera software permits analysis to be as simple or as complex as needed. HiQuad is ideal for use in applications such as: surface science, plasma research, isotope ratio MS, trace gas analysis, and desorption studies. The mass spectrometer also features a built-in OPC server for local
emote operation via Ethernet for easy computer connectivity. The HiQuad is available as a complete system or as a complete range of component parts for those who are building their own spectrometers. Pfeiffer Vacuum Inc., Milpitas, CA USA; ph 603/578-6522, www.pfeiffer-vacuum.com.
Multistage vacuum system
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COAX is an improved design based on this company’s multistage concept for creating vacuum with compressed air. It can be easily integrated into the body of manufacturing machinery with multistage cartridges, making maximum use of energy by eliminating line losses and inefficiencies. Also available is the atmospheric quick-release valve (AQR), which does not consume any additional compressed air in order to release a part. It acts like a traditional quick-release valve, but uses the ambient atmospheric pressure as its energy source. A decentralized system with vacuum pumps located at the point-of-use reportedly uses less energy. PIAB North America, Hingham, MA USA; ph 800/321-7422 or 781/337-7309, www.piab.com.
Concentration monitor
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The CR-288 concentration monitor is installed in the process stream or at point of use where chemicals are delivered or blended, and delivers measurements of the concentration and temperature of process fluids. Designed specifically for the semiconductor industry, it is physically small, easy to install, and serviceable in the field. The monitor’s software enables the technician to calibrate the unit for chemical mixtures used in semiconductor laboratory or manufacturing processes, including etching, wafer cleaning, and CMP. Concentration accuracy is ±0.1% based on measuring ethylene glycol and water at 20 psig (1.3 bar), 24.5-26°C), and calibration range of 0 to 100%. Temperature accuracy is 0.1°C. Temperature resolution is 0.01°C. Response time is 1.2 sec. Swagelok Semiconductor Services Co., Santa Clara, CA USA; ph 408/349-5934, www.swagelok.com/semiconductor.
Gas composition sensor with ppb sensitivity
The Vx-3100 gas composition sensor analyzes process gases and chemistries conducted in moderate vacuum to above atmospheric pressures (1 Torr to 15 psig). Mated to any process chamber, gas supply, or exhaust line, the compact sensor detects multicomponent gas species with sensitivity to parts per billion (ppb). Uses include fault detection in gas delivery systems, early leak detection in chambers, and process chemistry monitoring, including process end-point. It detects gases of many types and of multiple components. Trace elements within noble and diatomic gases can also be seen. Sampling up to 20 times/sec, the Vx-3100 is suitable for real-time control of both production tools and gas distribution networks. Verionix, Wilmington, MA USA; ph 978/253-4902, www.verionix.com.