Product News
04/01/2005
WN/W deposition system reduces contact resistance
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The Altus DirectFill tungsten nitride/tungsten (WN/W) deposition system is designed for contact and via fill at 65nm and below technology nodes. DirectFill reportedly eliminates the need for conventional titanium/titanium nitride toolsets, because the technique can reduce contact resistance (Rc) in a single system, rather than a standard multiple-tool configuration. Preclean is conducted in one process module, pulsed nucleation-layer (PNL) deposition of WN in another, and then combined PNL and chemical-vapor deposition of W in a third module. All processes are performed below 400°C for compatibility with future integration requirements. Novellus Systems Inc., San Jose, CA; ph 408/943-9700, fax 408/570-2635, e-mail [email protected], www.novellus.com.
CD metrology tool can measure up to 1000 sites/hr
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The Yosemite SP-1000 critical-dimension scanning electron microscope (CD-SEM) provides measurement throughput as high as 1000 sites/hr and clear imaging of the bottom of high aspect-ratio contact holes for the 65nm node. The tool uses landing energies as low as 100eV for accurate measurement and control of resist slimming, and 3D model-based critical-shape metrology images accurately without degrading samples or reducing system throughput. It has three loadport modules and is configurable for 150mm/200mm or 200mm/300mm without hardware modification. Soluris Inc., Concord, MA; ph 978/318-4041, e-mail [email protected], www.soluris.com.
Portable counter offers desktop-to-cleanroom operation
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The Lasair II 310B airborne particle counter, weighing only 15.5 lb., counts particles from 0.3-25.0µm and is suitable for verifying ASHRAE regulations. Data collection and communication features include the ability to control the counter from a desktop PC’s web browser while it samples in the cleanroom. Users can then download data to the desktop after sampling. A rugged, chemically resistant cover can be wiped down with harsh cleaners, and a removable, externally rechargeable battery allows continuous mobile monitoring. Particle Measuring Systems, Boulder, CO; ph 303/443-7100, e-mail [email protected], www.pmeasuring.com.
Laser mask writer can maintain 2-hr write time
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The Alta 4700 mask-pattern generation system is a laser-based, deep-ultraviolet system for volume manufacturing of all 90nm and most 65nm critical mask layers. A 42×, 0.9NA objective lens reportedly boosts mask resolution, pattern fidelity, CD control, and placement performance. The system features aerial-image improvement pattern rendering that closely matches electron-beam system fidelity, and with its high-bandwidth datapath, can maintain an average write time of 2 hr (up to 4× faster than e-beam systems), cutting mask manufacturing cycle time to almost half that of 50kV systems. Applied Materials Inc., Santa Clara, CA; ph 408/563-0647, fax 408/986-2855, e-mail [email protected], www.appliedmaterials.com.