Products
08/01/2003
Etch system streamlines processes
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The Producer Etch system can be used in applications such as aluminum via, bond pad, and spacer etch across multiple device generations. The system features high-speed, dual-wafer handling, and can be configured with up to three Twin Chamber modules for simultaneous processing of six wafers. The system meets critical process requirements such as striation-free, damage-free, and profile-controlled etching. According to the company, Producer Etch reduces capital costs for high-volume chip manufacturing. Applied Materials Inc., Santa Clara, CA; ph 408/986-7877, www.appliedmaterials.com.
Vertical furnace enables flexible batch sizes
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The A412 SmartBatch vertical furnace has dual boats and dual reactors, and answers the need for short cycle times and flexible batch sizes, at low cost of ownership. The system is aimed at oxidation, diffusion, LPCVD, and ALCVD applications, and can accommodate 1–50 wafers. On-board features include predictive temperature control, faster temperature ramp up/-down, fast pump-down and back fill, low reactor thermal mass, and integrated metrology. ASM, Bilthoven, The Netherlands, ph 31/30-229-84-11, www.asm.com.
CD measurement system is for wafers & photomasks
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The MicroLine 400 critical dimension measurement system automatically measures linewidth, overlay, and other critical features on wafers and photomasks. Features from 0.5–400µm can be measured, and measurement repeatability is 4nm (1s) or better with a 100¥ objective lens. A motorized x-y stage provides <25µm stage positional accuracy. Software applications programs are written using the text-based Measurement Control Language, which controls all functions of the MicroLine 400. Micro-Metric, San Jose, CA; ph 408/452-8505, [email protected], www.micro-metric.com.
System detects wafer-edge defects
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The SmartEdge wafer-edge defect inspection system locates and classifies defects and particles on a wafer edge, including point defects, scratches, area defects, chips, cracks, etch defects, crystal growth, and epi defects. These defects are automatically detected, eliminating the need for costly, labor-intensive visual edge inspection. Using new vision and image recognition components, the SmartEdge can differentiate between usable and reject wafers. EV Group, Scharding, Austria; ph 43/7712-5311-4001, [email protected], www.EVGroup.com.
Wet process stations
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The series 1412 wet process stations feature a rugged and safety-oriented design and maximum chemical resistance. Stations can be ..made of stainless steel, white polypropylene, and fire-resistant white polypropylene. Standard sizes are available up to eight feet wide and 42 in. deep; other sizes are available on request. Clean Air Products, Minneapolis, MN; ph 800/423-9728, [email protected], www.clean.airproducts.com.
Software for lithographic exposure
Weir PW software provides a toolset for lithographic exposure and process control from any metrology source. The software uses custom models of wafer and field systematic feature distributions to calculate critical control elements needed for setup and tuning, and to provide a core analysis for advanced process control modules used for equipment or process window control. This toolset can improve a lithographer's ability to effectively work within the narrow process margins of sub-100nm designs. TEA Systems Corp., Alburtis, PA; ph 610/682-4146, [email protected].
Flip chip underfill dispenser
The dispenser generation DJ335 was designed specifically for flip chip underfill and includes a high-resolution pattern recognition system that guarantees micron-precision chip detection. Two independently programmable light sources with vertical light through the lens and a diffuse ring light offer optimal illumination for the recognition of every chip, including tilted chips. Hesse & Knipps Inc., San Jose, CA; ph 408/436-9300, [email protected], www.hesse-knipps.com.
IP protection software
The IProtect family of software products protects intellectual property (IP) from theft while providing users with transparent IP access. The first product in the family, IProtect ePack, is designed for IP vendors to protect licensed IP. Using the IProtect ePack system, an IP vendor ships the IP in an enhanced file format that cannot be converted to the original IP files by the licensee. IProtect ePack client software will allow transparent access by any design or development tools, but the original IP files are never accessible for copying by users. OnmiSecure, San Jose, CA; ph 408/293-1830, www.omnisecure.com.
Wafer calibration software
SussCal Version 5.1 calibration software is for wafer-level measurements. It provides the interface between the VNA and probe station, simplifying and automating the task of wafer-level calibration. The calibration process removes the effects of systemic errors inherent in all VNAs, ensuring accurate and repeatable measurements. SUSS MicroTec, Dresden, Germany; ph 011/49 35240730, [email protected], www.suss.com.
Surface metrology profiler
The Dektak 8 advanced development profiler for research and production surface metrology combines high repeatability, low-force tip technology, and advanced 3-D data analysis for accurate characterization of MEMS, semiconductors, data storage devices, and other surfaces. The Dektak 8 provides 7.5Å, 1s step height repeatability and a vertical range of up to 1mm. Its overhead gantry design allows for long scan roughness, planarity, and flatness measurements up to 200mm square, in a compact bench top configuration. Veeco Instruments, Santa Barbara, CA; ph 805/967-1400, www.veeco.com
Wafer bumping equipment
The PacLine 2000-A50 fully automatic, wafer-level electroless nickel/gold bumping equipment provides high throughput, with an average processing time of 20 min., which translates into 150 200mm or 75 300mm wafers/hour. The system consists of input and output stations, a robotic handling system, an online central computer control unit with QualPac software for process and batch replenishment, SPC, and process data storage. The PacLine 2000-A50 is adaptable to any facility. Pac Tech USA, Santa Clara, CA; ph 408/588-1925, www.pactech-usa.com.
Reticle filter
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This advanced reticle filter is for efficient removal of gas-phase organics and other contaminants within lithography tools. The filter is smaller than point-of-use filters for lens purge and optics protection, allowing maximum contamination control of small environments. Made with activated carbon, the reticle area filter won't affect transmission of O2, H2O, and relative humidity. Donaldson Co. Inc., Minneapolis, MN; ph 952-887-3841, www.donaldson.com.
Rotation stage for wafer inspection
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The RGV100 direct-drive motorized rotation stage offers high speed, good reliability, high precision, and a low profile for semiconductor wafer inspection and related applications, ..including those involved in MEMS manufacture. The direct-drive approach eliminates the need for a worm gear. The RGV100 is 49mm high, and a 50mm dia. through-hole allows routing of cables and vacuum lines through the stage, which is critical for semiconductor applications. Newport Corp., Irvine, CA; ph 800/222-6440, www.newport.com.
Tool rebuilding & maintenance services
Specialized rebuilding, reconfiguring, and servicing of most semiconductor tools, including those no longer supported by the original OEM, can lower direct fixed costs for chipmakers. These offerings include long-term contracts for outsourcing internal maintenance of semiconductor tools. Maintenance service is claimed to be less costly than from OEMs, and includes service for many different types of equipment. SemiResource Div. of SMT Resource Group LLC, Temple, TX; ph 254/771-3311, www.semiresource.com.
VUV beam delivery system
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This VUV beam delivery system is for excimer lasers, especially those operating in the demanding short wavelength (157–193nm) ..vacuum ultra violet (VUV) range. The system is flexible, modular, and designed for quick and easy reconfigurability. This inert gas-purged system is suited to precision micromachining of medical devices, including lab-on-a-chip and biosensors. JPSA Laser, Hollis, NH; ph 603/595-7048, [email protected], www.jpsalaser.com.
Batch control software
SamplerSight software allows operators to manage the sampling requirements for batch-based operations and also provides a comprehensive view of batch information with histogram, time plot, and tabular data. Recipe functionality for sample configurations reduces setup time between batches. Particle Measuring Systems, Boulder, CO; ph 303/443-7100, www.pmeasuring.com.
Laser source
The Model 1732 compact laser source is a 2.5GHz-modulated, 1310nm source for test and measurement applications. Benefits include use of high-performance microwave circuitry that ensures clean delivery of the electrical input to the laser chip and results in clean eye diagrams. The Model 1732 is useful in laboratory applications or for characterizing 2.5Gbit/sec data communications components. New Focus, San Jose, CA; ph 408/919-6011, [email protected], www.newfocus.com.
Microsteppers for lithography research
These lines of 193nm and 157nm DUV microsteppers — the MS-193-X, MS-193-I, and MS-157-X — are for conducting entry-level research in advanced lithography at DUV wavelengths without incurring the high costs of using more macrofield steppers. Their small 0.1mm image dia. allows tool costs to be lower than microsteppers that have larger field sizes. The MS-193-I is claimed to be the first commercially available immersion lithography tool. Exitech, Yarnton, UK, ph 44/1865 290-400, [email protected], www.exitech.co.uk.
Cross roller translation stages
This line of 1.75- and 2.62-in. cross roller translation stages compliments the manufacturer's ball bearing translation stages. They offer load-carrying capability claimed to be twice that of similar ball bearing translation stages. They are rated for over 100 million inches of travel at the specified load, and provide up to five times the life cycle of comparable ball bearing stages without performance loss. Applications include wafer inspection, microscopy, machine vision inspection, and interferometry. Edmund Optics Inc., Barrington, NJ; ph 856/573-6250, www.edmundoptics.com.
Rotary tables for 300mm wafers
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RotoRing300 direct drive rotary tables provide angular positioning for front- and backend semiconductor-manufacturing applications. A large-diameter air-bearing system ..provides sufficient stiffness for high payloads. Backlash, friction, and wear inherent in conventional worm, screw, and belt drives are eliminated. Rotation capability and a low profile allow users to incorporate these tables into high-speed and space-constrained applications. IntelLiDrives Inc., Philadelphia, PA; ph 215/728-6804, [email protected], www.intellidrives.com.
Vibration control system
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This portable system uses active feedback to achieve high levels of vibration isolation for a variety of high-resolution instruments, such as interferometers and photo-imaging microscopes. The 800 Series tabletop unit isolates all six possible translational and rotational modes of vibration. With an ultra-low natural frequency (0.7Hz), the system produces no low-frequency resonance. It damps vibrations from 1.0–1000Hz, whether the vibration source is within the building or another piece of equipment on the same table. Kinetic Systems Inc., Boston, MA; ph 617/522-8700, [email protected], www.kineticsystems.com.
Pressure transducer for DI water
The DI pressure transducer for deionized water measures line pressure for monitoring or controlling critical semiconductor process conditions for high-purity chemical, DI water, and slurry-polishing applications. The transducer features a simple zero and span adjustment design, and combats inconsistent measurements. NT International, subsidiary of Entegris, Chaska, MN; ph 952/556-3131, www.entegris.com.