Lithography data analysis

12/01/1998

Lithography data analysis

ProDATA, a software tool for analyzing experimental lithography data, imports, analyzes, and visualizes experimental data and provides optimum lithographic process information in a matter of seconds. It analyzes swing curves, contrast curves, and focus-exposure data, and uses advanced lithographic analysis algorithms to provide results. Information can be imported in multiple formats and analyzed using a two-step curve fitting process, the entire process can be recorded for later review, and results can be exported into a variety of applications. Using ProDATA with the Focus-Exposure Module, for example, engineers can easily and accurately: determine the process window and depth-of-focus (DOF) of experimental and simulated focus-exposure data; determine the overlapping area of any number of process windows and the resulting DOF curves; analyze DOF using either rectangles or ellipses (for systematic or random errors, respectively); analyze CD, Eo or reflectivity swing curve data to determine the minima, maxima, swing ratio, and period; and analyze H-D contrast curve data to determine dose to clear and photoresist contrast. FINLE Technologies Inc., Austin, TX; ph 512/327-3781, www.finle.com.