Thin film supplement: Reactive sputtering

12/01/1998

Thin film supplement: Reactive sputtering

This 88-page supplement to the Handbook of Thin Film Process Metrology covers reactive sputtering, and will be of interest to industrial and academic researchers, as well as owners of the main volume. Recent developments in the field, including unbalanced magnetron sputtering and pulsed reactive sputtering, are described. The book also covers applications, practice, and manufacturing techniques. Edited by D. Glocker, I. Shah, and W. Westwood. ISBN 0 7503 0528 2. Price: $70. Institute of Physics Publishing, Williston, VT; ph 800/632-0880, fax 802/864-7626, e-mail [email protected].