Submicron mircolithography

12/01/1998

Submicron microlithography reference

This 800-page text details both elementary and advanced aspects of submicron microlithography, providing a treatment of theoretical and operating practices, as well as current research in the field. Topics covered include mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology. Citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs clarify the material. Edited by James R. Sheats and Bruce W. Smith. ISBN 0-8247-9953-4. Price: $175. Marcel Dekker Inc., New York, NY, Basel, Switzerland; (US, Canada, South America) ph 800/228-1160, fax 914/796-1772, e-mail [email protected]; (Europe, Africa, Middle and Far East, Australia, India, China) ph 41/61-261-8482, fax 41/61-261-8896, e-mail [email protected].