Dual reactor vertical furnace

12/01/1998

Dual reactor vertical furnace

Designed for 300-mm wafer processing, the A412 dual reactor vertical furnace is a combination of an LPCVD silicon nitride and TEOS tube and an LPCVD in situ doped polysilicon tube. It is configured with pre-purged FOUP cassettes and a nitrogen purged minienvironment, and is capable of 130-nm device processing. ASM Europe BV, Bilthoven, The Netherlands; ph 31/30-2298-411, www.asm.com.