DUV microscope

12/01/1998

DUV microscope

The LU2000-DUV inspection system allows fab operators to observe and analyze lines and spaces with widths down to 0.1 ?m by using visible light to inspect ultra-minute patterns and then changing (at the touch of a switch) to a laser light source at 266 nm to obtain bright, high signal-to-noise-ratio images that appear monochromatically on a monitor, all in real time. The system is optimized for inspection of masks, reticles, and various data storage media. It provides observation at up to 13 images/sec; magnification ranges up to 10,000? can be achieved, all observation is noncontact, and no vacuum is needed. Nikon Instrument Group, Melville, NY; ph 800/526-4566 ext P8146.