Cluster tool

11/01/1998

Cluster tool

This multiwafer, batch-processing cluster tool is designed for low-pressure CVD and ultrahigh vacuum CVD films. It simultaneously processes a boatload of wafers in each of the three process chambers in a manner similar to that of a single-wafer, multichamber cluster tool. The system has three independent process chambers, a loadlock, and a robotic transfer chamber to move the wafer boat between process tubes and the loadlock under an ultrahigh-vacuum condition. CVD Equipment Corp., Ronkonkoma, NY; ph 516/981-7081, fax 516/981-7095, e-mail [email protected], www.cvdequipment.com.