Polymeric materials for wafer handling and processing

10/01/1998

Polymeric material for wafer handling and processing

Vespel is a unique polymeric material that exhibits good cleanliness, resists chemical attack, offers good dielectric and insulative performance, minimizes in-chamber particles, and provides dimensional stability. Because it is inert to process gases, Vespel is able to solve aluminum and aluminum fluoride contamination problems by providing protection against denser plasmas that attack aluminum chamber walls. The material is used in etch applications in the process chamber for chamber liners, gas distribution plates, wafer clamping rings, insulator rings, shadow rings, edge rings, confinement and shield rings, and lift pin components. Vespel is also used in wafer and chip handling, test equipment, and PVD, CVD, ion implant and other processes. DuPont, Wilmington, DE; ph 800/972-7252, fax 800/477-5790.