Rooftop lithography chemical air filter

10/01/1998

Rooftop lithography chemical air filter

The Vaporsorb rooftop lithography chemical air filter offers protection against the full range of total molecular base gas phase contaminants. It effectively removes airborne molecular contaminants, reducing the discharge of amines to the sub ppb range, 1.5 to 6 ? better than comparable filters. They also protect against the NMP bleeding problem found with ion exchange filters. The filters are thoroughly tested on DUV photolithography tools and in controlled laboratory conditions. The filters can be integrated with the company`s total molecular base real-time monitor. Extraction Systems Inc., Franklin, MA; ph 508/553-3900, fax 508/553-3901.