Low-defectivity CMP slurry

10/01/1998

Low-defectivity CMP slurry

SEMI-SPERSE D7000 is a low-defectivity CMP slurry designed for devices of =0.18 ?m. As design rules shrink, small particles and scratches that were previously noncritical can become yield-endangering microdefects. High-purity CAB-O-SIL fumed silica grains serve as the abrasive component in the slurry, and highly stable dispersion controls the level of the particles that can lead to wafer level defectivity in 0.18-?m processes. This defectivity reduction achieves good planarization rates and uniformity while maintaining superior colloidal stability characteristics. Cabot Corp., Aurora, IL; ph 630/585-9471 ext 241.