Chemical generation

10/01/1998

Chemical generation

The GCG-CHEMPURE system generates ultrapure chemicals, including NH4OH and HCl. Designed to be housed in the chemical room of a fab, the compact gas-to-chemical generation system can help to reduce particles and metallic impurities in wafer-cleaning process chemicals. The on-site generation of chemicals is achieved by mixing ultrapure water with ultrahigh-purity anhydrous gases - such as ammonia, hydrogen chloride, or hydrogen fluoride - to form wafer-cleaning or oxide etching chemicals. Process temperature control in the generating vessels is achieved with heat exchangers cooled by a closed-loop recirculation chiller, while stringent microcontamination control is accomplished through recirculation of the generated chemical by an ultrahigh-purity pump to a recirculation vessel. Air Products and Chemicals Inc., San Francisco, CA; ph 610/481-3673, e-mail [email protected], www.airproducts.com.