193-nm ArF excimer laser

10/01/1998

193-nm ArF excimer laser

The NovaLine A1000 excimer laser, intended for DUV lithography, produces 5 W of output power at a 1-kHz repetition rate. This power is delivered with a spectral bandwidth of <0.6 pm (FWHM), enabling the laser to generate circuit structures <0.18 ?m, using all-refractive projection optics. Output is actively controlled using the PowerLok energy stabilization system to achieve an overall exposure dose stability of better than 0.8%. Lambda Physik Inc., Ft. Lauderdale, FL; ph 954/486-1500, fax 954/486-1501, e-mail [email protected], www.lambdaphysik.com.