Stepper lithography exposure tool

10/01/1998

Stepper lithography exposure tool

Model SIM-3300, an exposure tool that is used to assist in process development, is specifically designed for 248-nm DUV photoresist testing, but is easily adapted for NUV as well. The system includes a light source, a precision stage, feedback circuitry, an intensity controller, and menu-based software. OAI, Milpitas, CA; ph 408/263-4944, fax 408/263-6389, www.oainet.com.