Transparent film metrology tool

09/01/1998

Transparent film metrology tool

This transparent film metrology system, SpectraLASER UTF, can characterize ultrathin films (<40 ?) and ultrathin film stacks such as ONO and OPO. Through the RTI Ultrathin Film Support Program, the UTF system will maintain leading-edge repeatability, accuracy, and tool-to-tool matching. Incorporating Multi-Domain Production Ellipsometry technology, the system combines multiple angle of incidence data acquisition with multiple laser (and optional UV) wavelengths to measure a spectrum of optical properties without adding dispersion unknowns. Easily driven via new software, the SpectraLASER UTF allows quick application development, and because it is engineered on the VANGUARD automation platform, it is already available for SMIF and 300-mm fabs. The new tool provides guaranteed sub-? thickness accuracy of ?0.5 ? and very good tool-to-tool matching of ? 0.1 ? for films up to 100-? thick, enabling chipmakers to ensure that all their chips have identical film thickness. Rudolph Technologies Inc., Flanders, NJ; ph 973/691-1300, fax 973/691-5480, www.rudolphtech.com.