Ion Implant metrology

09/01/1998

Ion implant metrology

Thermal-wave technology enables the Therma-Probe 500 metrology tool to measure directly on product or test wafers, immediately after ion implant. This ensures that the measurement reflects the performance of the implanter rather than subsequent steps - such as annealing - which are required with other techniques. Because the thermal-wave technique is optical, measurements can be made directly through screen oxides. A state-of-the-art pattern recognition system provides effortless measurement of sites as small as 10 ? 10 ?m2 anywhere on product wafers, and a new high-speed robot gives production throughput 100% greater than previous Therma-Probe models. Therma-Wave Inc., Fremont, CA; ph 510/668-2273, fax 510/656-3852, e-mail [email protected], www.thermawave.com.