Pattern-generation system

09/01/1998

Pattern-generation system

The MEBES 5000 is an electron-beam raster-scan pattern-generation system that meets the accuracy and throughput requirements of the 0.18-?m mask generation. With the new system, the user retains control of the design grid, writing strategy, and exposure parameters, allowing the maskmaker to optimize results for leading-edge mask production, as well as for mask development. High speed is one benefit of the 5000 - it permits production of complex 0.18-?m device generation masks as much as eight times faster than the MEBES 4500. This enhanced speed derives from the 320-MHz dual Super Flash High Throughput Memory (SFHTM) data path, which achieves 1.28 gigapixel/sec data rates. Etec Systems Inc., Hayward, CA; ph 510/783-9210, www.etec.com.