Shaped-beam reticle writer

09/01/1998

Shaped-beam reticle writer

The ZBA31H+ is an electron beam reticle writer designed to expose the new 230-mm mask standard. The lithographic performance of the ZBA tool has been acceptedfor maskmaking of 0.25- and 0.18-?m production requirements. The variable-shaped beam approach allows users to enhance productivity without sacrificing accuracy and pattern quality. A fully automatic blank handling and loading sub-unit is an integral part of the system, permitting a degree of automation comparable to mass-production optical stepper installations. The ZBA system is integrated into this company`s toolkit by means of a metrology-link feature that synchronizes the mask blank support between lithography and metrology tools. Leica Microsystems Inc., Deerfield, IL; ph 800/248-0123, fax 847/405-0147, e-mail [email protected].