Plasma source

09/01/1998

Plasma source

The Stinger is a new plasma source for the Performance Enhancement Platform (PEP) systems. It uses the same microwave source technology that is featured in the Millennia 300-mm integrated clean system, and it offers high removal rates and high throughput for 200-mm photoresist, residue removal, and isotropic etch applications. Users can now develop their 300-mm integrated clean processes on this company`s 200-mm hardware, facilitating an easy transition to 300 mm. The Stinger`s core technology is already qualified for 0.18 ?m and has a 5-?m/min removal rate of DUV resists with =5% within wafer uniformity. GaSonics International, San Jose, CA; ph 408/570-7193, fax 408/570-7059, www.gasonics.com.