Plasma process characterization

09/01/1998

Plasma process characterization

Series 1000 EQP is a high-sensitivity combined ion energy analyzer and quadrupole mass spectrometer designed expressly for the characterization of plasma processes. It combines a high-performance, triple-filter, quadrupole mass spectrometer with a 45? sector field energy analyzer, integral RGA ionizer, and wide dynamic range pulse counting Channeltron detector, providing mass range capability up to 3000 amu, energy range options to 1000eV, and externally floatable to 10 KeV. Standard configurations include magnetically shielded systems for operation in magnetically confined plasma, and extended probe versions for translation across large plasma reactor chambers. Options and accessories include a powered sampling electrode for in-situ plasma studies to identify precisely the wafer or workpiece environment, and electron attachment ionization for detailed studies of electronegative reaction products. These species are very important, as many of the gases used in plasma processing are electronegative, e.g., fluorocarbons, ethane, sulphur hexafluoride, and silane. Hiden Analytical Ltd., Warrington, UK; ph 44/1925-445225, fax 44/1925-416518, e-mail mbuckley@ hiden.demon.co.uk, www.hiden.co.uk.