Ellipsometry for 300-mm wafers

09/01/1998

Ellipsometry for 300-mm wafers

The SD3400 ellipsometer is a thin-film measurement system for substrates of 200- or 300-mm that can determine the thicknesses, refractive indices, and absorption constants of thin films from 0 nm to a few microns. In both production and R&D environments, the SD3400 analyzes transparent films such as oxides, nitrides SiPOS, and ARC, as well as absorbing films such as a-Si, polysilicon, and polyimide. Simultaneous evaluation of multilayers (ONO, OPO or CMP films) can be achieved using the infrared option DIR, which allows the characterization of polysilicon or a-Si with respect to refractive index and k-value at HeNe wavelengths. Philips Analytical Technology, Almelo, The Netherlands; ph 31/546-534382, fax 31/546-534598, www.philips.com/axr