Wafer Inspction station

08/01/1998

Wafer inspection station

The Optistation-V inspection system accommodates wafers up to 200 mm. The system provides very good optical inspection performance using brightfield, darkfield, differential interference contrast (DIC), or fluorescence techniques, as well as in optional confocal mode. The halide illumination system offers brighter intensity at high magnifications, which is especially useful in darkfield or DIC inspection, and fast and accurate autofocus cuts throughput time. Front and backside macro inspection with tilt, wobble, and rotation is also available, including perimeter backside macro, for more comprehensive macro inspection. Optistation-V is designed for easy use with the DART for Windows NT defect review and inspection system software. It is compatible with Smart-Tag and SMIF manufacturing standards, and can interface with selected KLA-Tencor wafer defect review stations. SMIF indexers and minienvironment enclosures are available. Nikon Inc., Melville, NY; ph 800/526-4566 ext P7045, www.nikonusa.com.