Rapid thermal processing

08/01/1998

Rapid thermal processing

The RTP XEplus Centura rapid thermal processing system doubles the temperature ramp rate of its predecessor, the XE Centura, to 150?C/sec and reduces overall temperature variation to 3?C, 3s. The high ramp rate shortens the heat treatment step so that dopants implanted in ultrashallow transistor junctions can be activated with minimal diffusion. The XEplus is well suited to several oxidation and nitridation applications, including nitrous oxide processes for gate dielectrics and thermal oxides processed with steam. Maximum system throughput is 112 wafers/hr. Applied Materials Inc., Santa Clara, CA; ph 408/563-4569, fax 408/986-2855.