Israels Nova expands metrology line

07/01/1998

Israel`s Nova expands metrology line

With a growing business in on-tool film thickness measuring systems for CMP, Nova Measuring Instruments, Rehovoth, Israel, hopes to expand its offerings to provide comparable on-line capabilities for CVD processes later this year, and measurements other than film thickness in 1999.

By performing a high-speed cross-wafer measurement immediately after processing and before the wafer leaves the tool, the Nova system provides a uniformity analysis not available from in situ systems, while offering quick feedback on process control. The data can also be used for rapid recalibration after maintenance. Data from the $150,000 system can be linked to the fab management computer system, and applications in lithography and etch are also envisioned, said managing director Giora Dishon. Beta testing is currently under way on feeding data directly to the polisher, which would allow the system to be stopped midway through a wafer lot if the process goes out of spec.

Dishon notes that the overall metrology market is seen nearly doubling from today`s $2 billion by the 2000-2001 time frame, and suggested that a significant portion of that market will be for systems integrated into process tools. "Equipment companies don`t have the expertise or culture for integrated metrology. The key issue is partnership," he said. Nova has established OEM-type relations with all major CMP polisher makers, and expects to maintain this model.

The toolmaker can make a machine "Nova-ready" by finding on-tool space and providing wafer handling access and minimal wiring for the spectrophotometry measuring system, which is a little larger than a wafer, with a small head that scans across the substrate. "In some cases, the end user writes one check for the CMP tool and the Nova system; we prefer that, but sometimes there are commercial barriers," said Dishon. In either case, the equipment manufacturer takes responsibility for setup, while Nova provides the warranty.

More than 200 systems have been installed on CMP tools, at most major European IC companies as well as in North America, Korea, Taiwan, and Japan; the largest base is in the US because of its earlier adoption of CMP. Dishon said he expects revenues to grow more than 3? this year after growing 60% from 1996 to 1997, and 10? from 1995 to 1996. Investors (including Israel-based Clal Electronic Industries, two Israeli venture funds, semiconductor equipment maker Fairchild Co., and an undisclosed chipmaker) have provided three rounds of capital thus far. "We would like to get more capital," noted Dishon. "We need it to keep on doing what we`re doing - 300 mm and speed improvements we can do with our own revenue, but to expand beyond CMP, we need more." He added that a 300-mm measuring unit should be ready around year`s end:

"Long term, I`m convinced this is the right thing - no one can do it on their own. But there is preaching to do." - P.N.D.